Dimensional characterization of biperiodic imprinted structures using optical scatterometry

Abstract
In this paper, we report on the characterization of biperiodic imprinted structures using a non-destructive optical technique commonly called scatterometry. The nanostructures consist of periodic arrays of square and circular dots which were imprinted in a thermoplastic polymer by thermal nanoimprint lithography. Optical measurements were performed using spectroscopic ellipsometry in the spectral region of 1.5-4 eV. The geometrical profiles of the imprinted structures were reconstructed using the Rigorous Coupled-Wave Analysis (RCWA) to model the diffraction phenomena by periodic gratings. The technique was also adapted for large scale evaluation of the imprint process. Uniqueness of the solution was examined by analyzing the diffraction of the structure at different experimental conditions, for instance at various angles of incidence. © 2013 Elsevier B.V. All rights reserved.

Citation
Gereige, I., Pietroy, D., Eid, J., & Gourgon, C. (2013). Dimensional characterization of biperiodic imprinted structures using optical scatterometry. Microelectronic Engineering, 112, 27–30. doi:10.1016/j.mee.2013.05.022

Publisher
Elsevier BV

Journal
Microelectronic Engineering

DOI
10.1016/j.mee.2013.05.022

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