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    Additive lithographic fabrication of a Tilt-Gaussian-Vortex mask for focal plane wavefront sensing

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    Name:
    Fu2021Additive_OptiFAB.pdf
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    Format:
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    Description:
    Accepted manuscript
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    Type
    Conference Paper
    Authors
    Fu, Qiang cc
    Amata, Hadi cc
    Gerard, Benjamin
    Marois, Christian
    Heidrich, Wolfgang cc
    KAUST Department
    Visual Computing Center (VCC)
    Computer Science Program
    Computer, Electrical and Mathematical Science and Engineering (CEMSE) Division
    Date
    2021-10-28
    Permanent link to this record
    http://hdl.handle.net/10754/674922
    
    Metadata
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    Abstract
    Spatially-varying features with uniform depths in large areas are challenging to achieve with etching based lithography. Here we propose an additive lithographic fabrication process to realize simultaneous presence of micrometer and millimeter features with low surface roughness. The etching step is replaced by sputter deposition and bi-layer lift-off to form the microstructures. Instead of removing materials, our method grows materials onto the substrate. We demonstrate its effectiveness with a reflective Tilt-Gaussian-Vortex mask with aluminum deposited on a fused silica substrate. The center has a diameter of 130 microns with minimum spacing of 2 microns, and the background pattern is 3 mm by 3 mm, with the largest flat region spanning 1.5 mm. A preliminary 4-level prototype has been tested in the Gemini Planet Imaging calibration unit upgrading project, and an improved 16-level sample has been measured. The results show uniform depth and surface roughness control in the whole area.
    Citation
    Fu, Q., Amata, H., Gerard, B., Marois, C., & Heidrich, W. (2021). Additive lithographic fabrication of a Tilt-Gaussian-Vortex mask for focal plane wavefront sensing. Optifab 2021. doi:10.1117/12.2602425
    Sponsors
    This work was supported in part by King Abdullah University of Science and Technology (KAUST) individual baseline funding and KAUST Visual Computing Center operational funding. The fabrication was done in the Nanofabrication Corlabs at KAUST. We also acknowledge the support of the Natural Sciences and Engineering Research Council of Canada (NSERC).
    Publisher
    SPIE
    Conference/Event name
    Optifab 2021
    ISBN
    9781510646278
    DOI
    10.1117/12.2602425
    Additional Links
    https://www.spiedigitallibrary.org/conference-proceedings-of-spie/11889/2602425/Additive-lithographic-fabrication-of-a-Tilt-Gaussian-Vortex-mask-for/10.1117/12.2602425.full
    ae974a485f413a2113503eed53cd6c53
    10.1117/12.2602425
    Scopus Count
    Collections
    Conference Papers; Computer Science Program; Visual Computing Center (VCC); Computer, Electrical and Mathematical Science and Engineering (CEMSE) Division

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