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dc.contributor.authorZhuang, Zhe
dc.contributor.authorIida, Daisuke
dc.contributor.authorVelazquez-Rizo, Martin
dc.contributor.authorOhkawa, Kazuhiro
dc.date.accessioned2021-10-05T10:41:30Z
dc.date.available2021-10-05T10:41:30Z
dc.date.issued2021-10-05
dc.date.submitted2021-07-16
dc.identifier.citationZhuang, Z., Iida, D., Velazquez-Rizo, M., & Ohkawa, K. (2021). Ultra-small InGaN green micro-light-emitting diodes fabricated by selective passivation of p-GaN. Optics Letters, 46(20), 5092. doi:10.1364/ol.438009
dc.identifier.issn0146-9592
dc.identifier.issn1539-4794
dc.identifier.doi10.1364/ol.438009
dc.identifier.urihttp://hdl.handle.net/10754/672117
dc.description.abstractHere, we proposed fabricating ultra-small InGaN-based micro-light-emitting diodes (µLEDs). The selective p-GaN areas were intentionally passivated using a H2 plasma treatment and served as the electrical isolation regions to prevent the current from injecting into the InGaN quantum wells below. Three kinds of green µLEDs, two squircle shapes with widths of 5 and 4 µm and one circular shape with a diameter of 2.7 µm, were successfully realized. The currentvoltage characteristics indicate that the series resistance and the turn-on voltage increase as the dimension of the µLED decreases. This originates from the diffusion of the hydrogen atoms into the unexpected conductive p-GaN area. The light output power density and the calculated external quantum efficiency of the µLEDs from a 5-µm-squircle to a 2.7-µm-circle were enhanced by 10−20% when compared to 98 × 98 µm2 µLEDs that were fabricated using mesa etching
dc.description.sponsorshipThe fabrication processes in this work were supported by Nanofabrication Core Labs in KAUST.
dc.description.sponsorshipKing Abdullah University of Science and Technology (BAS/1/1676-01-01).
dc.publisherThe Optical Society
dc.relation.urlhttps://www.osapublishing.org/abstract.cfm?URI=ol-46-20-5092
dc.rightsArchived with thanks to Optics Letters
dc.titleUltra-small InGaN green micro-light-emitting diodes fabricated by selective passivation of p-GaN
dc.typeArticle
dc.contributor.departmentComputer, Electrical and Mathematical Science and Engineering (CEMSE) Division
dc.contributor.departmentElectrical and Computer Engineering Program
dc.contributor.departmentElectrical and Computer Engineering
dc.identifier.journalOptics Letters
dc.rights.embargodate2022-10-05
dc.eprint.versionPost-print
dc.identifier.volume46
dc.identifier.issue20
dc.identifier.pages5092
kaust.personZhuang, Zhe
kaust.personIida, Daisuke
kaust.personVelazquez-Rizo, Martin
kaust.personOhkawa, Kazuhiro
kaust.grant.numberBAS/1/1676-01-01
dc.date.accepted2021-08-18
refterms.dateFOA2021-10-05T10:42:48Z
kaust.acknowledged.supportUnitCore Labs
kaust.acknowledged.supportUnitNanofabrication Core Lab
dc.date.published-online2021-10-05
dc.date.published-print2021-10-15


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