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    Synthesis of Silicon and Silicon Carbide Nanoparticles by Pulsed Electrical Discharges in Dielectric Liquids

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    Original-Article SiC nanoparticles.pdf
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    22.90Mb
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    Accepted manuscript
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    Type
    Article
    Authors
    Hamdan, Ahmad
    Abiad, Douaa El
    Cha, Min Suk cc
    KAUST Department
    Mechanical Engineering Program
    Physical Science and Engineering (PSE) Division
    KAUST Grant Number
    OSR-2020-CPF-1975.37
    Date
    2021-09-07
    Online Publication Date
    2021-09-07
    Print Publication Date
    2021-11
    Embargo End Date
    2022-09-07
    Submitted Date
    2021-03-26
    Permanent link to this record
    http://hdl.handle.net/10754/671166
    
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    Abstract
    Silicon carbide (SiC) has been widely used in many applications, which require high mechanical endurance or high electrical resistance. It also serves as a basic material for light emitting diodes. Here, we present an in-liquid plasma method to produce SiC nanoparticles. A sustained spark-discharge in a dielectric liquid, which is energized by a nanosecond pulsed power supply, is established for the synthesis. To provide Si and C, we employed graphite and silicon as electrodes and cyclohexane (CHX) and tetramethylsilane (TMS) as dielectric liquids. For a reasonable comparison, we tested various combinations of electrode and liquid, namely Si-to-C in CHX, Si-to-Si in CHX, and C-to-C in TMS. We found that discharges in CHX produce Si particles encapsulated in C-shell and Si nanoparticles in C-matrix. Meanwhile, discharges in TMS consistently produce SiC nanoparticles with an average size of ~ 10 nm, regardless of the electrode material.
    Citation
    Hamdan, A., Abiad, D. E., & Cha, M. S. (2021). Synthesis of Silicon and Silicon Carbide Nanoparticles by Pulsed Electrical Discharges in Dielectric Liquids. Plasma Chemistry and Plasma Processing. doi:10.1007/s11090-021-10205-3
    Sponsors
    This publication is based upon work supported by the King Abdullah University of Science and Technology (KAUST) Office of Sponsored Research (OSR) under Award No. OSR-2020-CPF-1975.37. The authors thank the Fonds de Recherche du Québec–Nature et Technologie (FRQ-NT) and the Canada Foundation for Innovation (CFI) for funding the research infrastructure.
    Publisher
    Springer Science and Business Media LLC
    Journal
    Plasma Chemistry and Plasma Processing
    DOI
    10.1007/s11090-021-10205-3
    Additional Links
    https://link.springer.com/10.1007/s11090-021-10205-3
    ae974a485f413a2113503eed53cd6c53
    10.1007/s11090-021-10205-3
    Scopus Count
    Collections
    Articles; Physical Science and Engineering (PSE) Division; Mechanical Engineering Program

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