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dc.contributor.authorZhao, Chao
dc.date.accessioned2021-04-12T08:46:52Z
dc.date.available2021-04-12T08:46:52Z
dc.date.issued2018-11-01
dc.identifier.citationZhao, C. (2018). Controlled Growth of InAs/GaAs Nanostructures by Droplet Epitaxy. Journal of Nanoscience and Nanotechnology, 18(11), 7617–7622. doi:10.1166/jnn.2018.16084
dc.identifier.issn1533-4880
dc.identifier.doi10.1166/jnn.2018.16084
dc.identifier.urihttp://hdl.handle.net/10754/668687
dc.description.abstractIn(Ga)As low-dimensional structures have wide applications from lasers to single photon emitters. Here, we demonstrate the controlled growth of InAs dots and rings on GaAs (100) by the droplet molecular beam epitaxy. At high temperature the InAs large dots with low density are formed by the crystallization of the low density indium droplets. The optical quality of the dots is improved because of the high temperature growth. While for low temperature growth, the morphology is governed by the interplay between the migration of surface indium adatoms and their crystallization that occurs inside and at the edge of the droplets. The high density InAs small dots are formed spontaneously by relaxing the mismatch strain. The discovery ameliorates In(Ga)As nanostructures for various applications by optimizing the growth conditions during droplet molecular beam epitaxy.
dc.publisherAmerican Scientific Publishers
dc.relation.urlhttp://www.ingentaconnect.com/content/10.1166/jnn.2018.16084
dc.rightsArchived with thanks to Journal of Nanoscience and Nanotechnology
dc.titleControlled Growth of InAs/GaAs Nanostructures by Droplet Epitaxy
dc.typeArticle
dc.contributor.departmentComputer, Electrical and Mathematical Science and Engineering (CEMSE) Division
dc.contributor.departmentImaging and Characterization Core Lab
dc.contributor.departmentPhysical Characterization
dc.identifier.journalJournal of Nanoscience and Nanotechnology
dc.eprint.versionPost-print
dc.identifier.volume18
dc.identifier.issue11
dc.identifier.pages7617-7622
kaust.personZhao, Chao


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