Inevitable chemical effect of balance gas in low temperature plasma assisted combustion

Type
Article

Authors
Snoeckx, Ramses
Cha, Min Suk

KAUST Department
Clean Combustion Research Center
Physical Science and Engineering (PSE) Division
Mechanical Engineering Program

KAUST Grant Number
BAS/1/1384–01–01

Online Publication Date
2020-11-07

Print Publication Date
2021-03

Date
2020-11-07

Submitted Date
2020-06-14

Abstract
Electrical discharges (or plasmas) have attracted researchers’ attention to improve combustion characteristics. One of its key effects, which is not fully understood yet, is the in-situ production of chemically reactive species. Since most related low temperature kinetic studies to-date have been performed under highly diluted conditions (> 99%), here we present the inevitable and undesirable chemical effect of a balance gas (Ar, He, N2) on the plasma-chemical kinetics. We employ a zero dimensional plasma-chemical kinetics model in combination with a (detailed and reduced) H2/O2/Ar reaction mechanism. The presented results indicate that (dissociative) quenching of excited (metastable) states dominates the H2 and O2 dissociation processes under highly diluted conditions. Additionally, in the reduced field intensity (E/N) domain, the type and amount of the balance gas significantly alters the fraction of electron energy transferred to the other species in the mixture. Therefore, we propose essential steps for the design of future kinetic studies for plasma assisted combustion.

Citation
Snoeckx, R., & Cha, M. S. (2021). Inevitable chemical effect of balance gas in low temperature plasma assisted combustion. Combustion and Flame, 225, 1–4. doi:10.1016/j.combustflame.2020.10.028

Acknowledgements
The research reported in this publication was funded by King Abdullah University of Science and Technology (KAUST), under award number BAS/1/1384–01–01.

Publisher
Elsevier BV

Journal
Combustion and Flame

DOI
10.1016/j.combustflame.2020.10.028

Additional Links
https://linkinghub.elsevier.com/retrieve/pii/S001021802030448X

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