Type
ArticleAuthors
Guang, YaoPeng, Yong
Yan, Zhengren
Liu, Yizhou
Zhang, Junwei
Zeng, Xue
Zhang, Senfu

Zhang, Shilei
Burn, David M.
Jaouen, Nicolas
Wei, Jinwu
Xu, Hongjun
Feng, Jiafeng
Fang, Chi
van der Laan, Gerrit
Hesjedal, Thorsten
Cui, Baoshan
Zhang, Xixiang

Yu, Guoqiang
Han, Xiufeng
KAUST Department
Physical Science and Engineering (PSE) DivisionMaterial Science and Engineering Program
KAUST Grant Number
OSR-2017-CRG6-3427Date
2020Embargo End Date
2021-07-22Permanent link to this record
http://hdl.handle.net/10754/664343
Metadata
Show full item recordAbstract
The emergence of magnetic skyrmions, topological spin textures, has aroused tremendous interest in studying the rich physics related to their topology. While skyrmions promise high-density and energy-efficient magnetic memory devices for information technology, the manifestation of their non-trivial topology through single skyrmions, ordered, and disordered skyrmion lattices could also give rise to many fascinating physical phenomena, such as the chiral magnon and skyrmion glass states. Therefore, generating skyrmions at designated locations on a large scale, while controlling the skyrmion patterns, is key to advancing topological magnetism. Here, we present a new, yet general, approach to the ‘printing’ of skyrmions with zero-field stability in arbitrary patterns on a massive scale in exchange-biased magnetic multilayers. By exploiting the fact that the antiferromagnetic order can be reconfigured by local thermal excitations, we use a focused electron beam with a graphic pattern generator to ‘print’ skyrmions, which we refer to as skyrmion lithography. Our work provides a route to design arbitrary skyrmion patterns, thereby establishing the foundation for further exploration of topological magnetism.Citation
Guang, Y., Peng, Y., Yan, Z., Liu, Y., Zhang, J., Zeng, X., … Han, X. (2020). Electron Beam Lithography of Magnetic Skyrmions. Advanced Materials, 2003003. doi:10.1002/adma.202003003Sponsors
Y.G., Y.P, and Z.R.Y. have contributed equally to this work. Financial support from the National Key Research and Development Program of China (Grants No. 2017YFA0206200), the National Natural Science Foundation of China (NSFC, Grants No. 11874409, 11804380, 51801087), Beijing Natural Science Foundation (Grant No. Z190009), the Strategic Priority Research Program (B) [Grant No. XDB07030200], the Key Research Program of Frontier Sciences (Grant No. QYZDJ-SSW-SLH016), the International Partnership Program (Grant No. 112111KYSB20170090) of the Chinese Academy of Sciences (CAS), K. C. Wong Education Foundation (GJTD-2019-14), and Fujian Innovation Academy, Chinese Academy of Sciences (Grant No. FJCXY18040302). J.Z. and X.Z. acknowledge the financial support from the King Abdullah University of Science and Technology (KAUST), Office of Sponsored Research (OSR) under the Award No. OSR-2017-CRG6-3427. S.L.Z. acknowledges the starting grant from ShanghaiTech University and the Eastern Scholar Scheme. T.H. gratefully acknowledges support from EPSRC (EP/N032128/1). We acknowledge beamtime on beamline I10 at Diamond Light Source (Didcot, UK) under proposals SI20183 and MM21868, and on the SEXTANTS beamline at the SOLEIL synchrotron (Gif-sur-Yvette, France) under proposal 20181882. Guoqiang Yu acknowledges helpful discussions with Haifeng Du and Junjie Li.Publisher
WileyJournal
Advanced Materialsae974a485f413a2113503eed53cd6c53
10.1002/adma.202003003