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    Electron beam lithography of magnetic skyrmions

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    Manuscript.pdf
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    Description:
    Accepted Manuscript
    Embargo End Date:
    2021-07-22
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    Thumbnail
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    Supplementary.docx
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    Description:
    Supplementary Material
    Embargo End Date:
    2021-07-22
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    Type
    Article
    Authors
    Guang, Yao
    Peng, Yong
    Yan, Zhengren
    Liu, Yizhou
    Zhang, Junwei
    Zeng, Xue
    Zhang, Senfu cc
    Zhang, Shilei
    Burn, David M.
    Jaouen, Nicolas
    Wei, Jinwu
    Xu, Hongjun
    Feng, Jiafeng
    Fang, Chi
    van der Laan, Gerrit
    Hesjedal, Thorsten
    Cui, Baoshan
    Zhang, Xixiang cc
    Yu, Guoqiang
    Han, Xiufeng
    KAUST Department
    Physical Science and Engineering (PSE) Division
    Material Science and Engineering Program
    KAUST Grant Number
    OSR-2017-CRG6-3427
    Date
    2020
    Embargo End Date
    2021-07-22
    Permanent link to this record
    http://hdl.handle.net/10754/664343
    
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    Abstract
    The emergence of magnetic skyrmions, topological spin textures, has aroused tremendous interest in studying the rich physics related to their topology. While skyrmions promise high-density and energy-efficient magnetic memory devices for information technology, the manifestation of their non-trivial topology through single skyrmions, ordered, and disordered skyrmion lattices could also give rise to many fascinating physical phenomena, such as the chiral magnon and skyrmion glass states. Therefore, generating skyrmions at designated locations on a large scale, while controlling the skyrmion patterns, is key to advancing topological magnetism. Here, we present a new, yet general, approach to the ‘printing’ of skyrmions with zero-field stability in arbitrary patterns on a massive scale in exchange-biased magnetic multilayers. By exploiting the fact that the antiferromagnetic order can be reconfigured by local thermal excitations, we use a focused electron beam with a graphic pattern generator to ‘print’ skyrmions, which we refer to as skyrmion lithography. Our work provides a route to design arbitrary skyrmion patterns, thereby establishing the foundation for further exploration of topological magnetism.
    Citation
    Guang, Y., Peng, Y., Yan, Z., Liu, Y., Zhang, J., Zeng, X., … Han, X. (2020). Electron Beam Lithography of Magnetic Skyrmions. Advanced Materials, 2003003. doi:10.1002/adma.202003003
    Sponsors
    Y.G., Y.P, and Z.R.Y. have contributed equally to this work. Financial support from the National Key Research and Development Program of China (Grants No. 2017YFA0206200), the National Natural Science Foundation of China (NSFC, Grants No. 11874409, 11804380, 51801087), Beijing Natural Science Foundation (Grant No. Z190009), the Strategic Priority Research Program (B) [Grant No. XDB07030200], the Key Research Program of Frontier Sciences (Grant No. QYZDJ-SSW-SLH016), the International Partnership Program (Grant No. 112111KYSB20170090) of the Chinese Academy of Sciences (CAS), K. C. Wong Education Foundation (GJTD-2019-14), and Fujian Innovation Academy, Chinese Academy of Sciences (Grant No. FJCXY18040302). J.Z. and X.Z. acknowledge the financial support from the King Abdullah University of Science and Technology (KAUST), Office of Sponsored Research (OSR) under the Award No. OSR-2017-CRG6-3427. S.L.Z. acknowledges the starting grant from ShanghaiTech University and the Eastern Scholar Scheme. T.H. gratefully acknowledges support from EPSRC (EP/N032128/1). We acknowledge beamtime on beamline I10 at Diamond Light Source (Didcot, UK) under proposals SI20183 and MM21868, and on the SEXTANTS beamline at the SOLEIL synchrotron (Gif-sur-Yvette, France) under proposal 20181882. Guoqiang Yu acknowledges helpful discussions with Haifeng Du and Junjie Li.
    Publisher
    Wiley
    Journal
    Advanced Materials
    DOI
    10.1002/adma.202003003
    ae974a485f413a2113503eed53cd6c53
    10.1002/adma.202003003
    Scopus Count
    Collections
    Articles; Physical Science and Engineering (PSE) Division; Material Science and Engineering Program

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