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    Multi-Level Nanoimprint Lithography for Large-Area Thin Film Transistor Backplane Manufacturing

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    Type
    Article
    Authors
    Dogan, Tamer
    de Riet, Joris
    Bel, Thijs
    Verbeek, Roy
    Katsouras, Ilias
    Meulenkamp, Eric
    Gelinck, Gerwin
    Jisk Kronemeijer, Auke
    Date
    2020-06-30
    Online Publication Date
    2020-06-30
    Print Publication Date
    2020-07-01
    Permanent link to this record
    http://hdl.handle.net/10754/664010
    
    Metadata
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    Abstract
    Thin film transistors (TFTs) are the basis for current AMOLED display arrays. For next- generation displays, higher resolution and cost-effective manufacturing of panels is adamant. The current benchmark patterning method in the display industry is photolithography. Here, we propose the use of a hybrid approach of nanoimprint lithography and conventional FPD processing for the realization of high-resolution display backplanes. We demonstrate the realization of sub-micron amorphous oxide semiconductor TFTs with multi-level nanoimprint lithography in order to decrease the number of patterning steps in display manufacturing. Top-gate self-aligned a-IGZO TFTs are realized with performance comparable to benchmark photolithography-based TFTs.
    Citation
    Dogan, T., de Riet, J., Bel, T., Verbeek, R., Katsouras, I., Meulenkamp, E., … Jisk Kronemeijer, A. (2020). Multi-Level Nanoimprint Lithography for Large-Area Thin Film Transistor Backplane Manufacturing. Journal of Photopolymer Science and Technology, 33(2), 241–244. doi:10.2494/photopolymer.33.241
    Sponsors
    This work is financed through the Flexlines project within the Interreg V-programme FlandersThe Netherlands, a cross-border cooperation programme with financial support from the European Regional Development Fund, and co financed by the Province of Noord-Brabant, The Netherlands, and King Abdullah University of Science and Technology (KAUST) OSR-CRF CRG funding.
    Publisher
    Technical Association of Photopolymers, Japan
    Journal
    Journal of Photopolymer Science and Technology
    DOI
    10.2494/photopolymer.33.241
    Additional Links
    https://www.jstage.jst.go.jp/article/photopolymer/33/2/33_241/_article
    ae974a485f413a2113503eed53cd6c53
    10.2494/photopolymer.33.241
    Scopus Count
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    Publications Acknowledging KAUST Support

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