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dc.contributor.authorZhang, Qiang
dc.contributor.authorZheng, Dongxing
dc.contributor.authorWen, Yan
dc.contributor.authorZhao, Yuelei
dc.contributor.authorMi, Wenbo
dc.contributor.authorManchon, Aurelien
dc.contributor.authorBoulle, Olivier
dc.contributor.authorZhang, Xixiang
dc.date.accessioned2020-06-02T12:52:56Z
dc.date.available2020-06-02T12:52:56Z
dc.date.issued2020-04-01
dc.date.submitted2019-09-04
dc.identifier.citationArray
dc.identifier.issn2469-9969
dc.identifier.issn2469-9950
dc.identifier.doi10.1103/PhysRevB.101.134412
dc.identifier.urihttp://hdl.handle.net/10754/662971
dc.description.abstractSurface roughness plays an important role on the magnetotransport properties of thin films, especially in ultrathin films. In this work, we prepared Fe thin films with various surface roughness by using different seed layers and studied the electrical transport and anomalous Hall effect. By tuning surface roughness scattering, the longitudinal resistivity (ρxx) measured at 5 K increases by one order of magnitude and the corresponding anomalous Hall resistivity (ρAHE) increases by three times with increasing roughness. The intrinsic, skew-scattering, and side-jump contributions to ρAHE were separated from our data. The anomalous Hall angle depends on the surface roughness, which may be of importance to the material engineering for achieving large spin Hall angle.
dc.description.sponsorshipThe research reported in this publication was supported by funding from King Abdullah University of Science and Technology (KAUST), Office of Sponsored Research (OSR) under Award No. CRF-2017-3427-CRG6. Q.Z. acknowledges the financial support by KAUST sensor project (REP/1/2708-01).
dc.publisherAmerican Physical Societyrevtex@aps.org
dc.relation.urlhttps://link.aps.org/doi/10.1103/PhysRevB.101.134412
dc.rightsArchived with thanks to Physical Review B
dc.titleEffect of surface roughness on the anomalous Hall effect in Fe thin films
dc.typeArticle
dc.contributor.departmentImaging and Characterization Core Lab
dc.contributor.departmentNanofabrication Core Lab
dc.contributor.departmentThin Films & Characterization
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.contributor.departmentMaterial Science and Engineering Program
dc.identifier.journalPhysical Review B
dc.eprint.versionPost-print
dc.contributor.institutionTianjin Key Laboratory of Low Dimensional Materials Physics and Preparation Technology, School of Science, Tianjin University, Tianjin 300354, China
dc.contributor.institutionIRIG-SPINTEC, CNRS, CEA, Grenoble INP, Université Grenoble Alpes, 38000 Grenoble, France
dc.identifier.volume101
dc.identifier.issue13
kaust.personZhang, Qiang
kaust.personZheng, Dongxing
kaust.personWen, Yan
kaust.personZhao, Yuelei
kaust.personManchon, Aurelien
kaust.personZhang, Xixiang
kaust.grant.numberCRF-2017-3427-CRG6
kaust.grant.numberREP/1/2708-01
dc.date.accepted2020-03-17
dc.identifier.eid2-s2.0-85084915972
refterms.dateFOA2020-06-03T05:15:11Z
kaust.acknowledged.supportUnitOffice of Sponsored Research (OSR)


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