Steam-Assisted Chemical Vapor Deposition of Zeolitic Imidazolate Framework
Type
ArticleAuthors
Huang, Jing-KaiSaito, Noboru
Cai, Yichen
Wan, Yi

Cheng, Chia-Chin
Li, Mengliu

Shi, Junjie
Tamada, Kaoru

Tung, Vincent

Li, Sean
Li, Lain-Jong

KAUST Department
Material Science and EngineeringMaterial Science and Engineering Program
Physical Science and Engineering (PSE) Division
Date
2020-04-01Online Publication Date
2020-04-01Print Publication Date
2020-05-04Submitted Date
2020-01-24Permanent link to this record
http://hdl.handle.net/10754/662455
Metadata
Show full item recordAbstract
Direct growth of metal–organic frameworks (MOFs) on substrates is a prerequisite to incorporating them into functional platforms and microdevices. Nevertheless, available reports mostly rely on the solvent-based routes, typically altered from processes for powder synthesis which are obstacles to the nanofabrication. Besides, although few vapor-phase growth approaches were presented, the proposed procedures required multiple steps, such as matrix deposition and post-conversion, to obtain desired MOF films on substrates. Here, we demonstrate a steam-assisted chemical vapor deposition (CVD) method to directly synthesize highly crystalline ZIF-67 thin films at the temperature <125°C. With a slow deposition rate, the ZIF-67 forms a highly oriented thin film on a c-plane sapphire substrate, indicating the growth is epitaxial. Furthermore, we demonstrate the integration of directly grown CVD ZIF-67 as the active material of chemiresistors onto microelectronic chips. The ZIF-67 chemiresistors exhibit responses to the gas molecules, which are capable of diffusing into the cage of ZIF-67 at room temperature. The proposed synthesis method of ZIF-67 thin films is simple, scalable, cost-effective, and promising for numerous applications.Citation
Huang, J.-K., Saito, N., Cai, Y., Wan, Y., Cheng, C.-C., Li, M., … Li, L.-J. (2020). Steam-Assisted Chemical Vapor Deposition of Zeolitic Imidazolate Framework. ACS Materials Letters, 485–491. doi:10.1021/acsmaterialslett.0c00026Sponsors
The authors acknowledge the facilities, as well as the scientific and technical assistance, from the NSW Node of the Australian National Fabrication Facility (ANFF) and the Research & Prototype Foundry Core Research Facility at the University of Sydney, part of the ANFF. The authors also thank the Electron Microscope Unit within the Mark Wainwright Analytical Centre at UNSW Sydney for the use of facilities. N.S. is grateful to the advanced graduate course on molecular systems for devices, a program for leading graduate schools, Kyushu University, Japan.Publisher
American Chemical Society (ACS)Journal
ACS Materials LettersAdditional Links
https://pubs.acs.org/doi/10.1021/acsmaterialslett.0c00026ae974a485f413a2113503eed53cd6c53
10.1021/acsmaterialslett.0c00026