Short Excited-State Lifetimes Enable Photo-Oxidatively Stable Rubrene Derivatives
Pointer, Craig A.
Carter, Kenneth R.
Young, Elizabeth R.
Briseno, Alejandro L.
KAUST DepartmentKAUST Solar Center (KSC)
Laboratory for Computational and Theoretical Chemistry of Advanced Materials
Material Science and Engineering Program
Physical Science and Engineering (PSE) Division
Online Publication Date2019-08-26
Print Publication Date2019-09-05
Embargo End Date2020-08-26
Permanent link to this recordhttp://hdl.handle.net/10754/658617
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AbstractA series of rubrene derivatives were synthesized and the influence of the side group in enhancing photo-oxidative stability was evaluated. Photo-oxidation half-lives were determined via UV-vis absorption spectroscopy, which revealed thiophene containing derivatives to be the most stable species. The electron affinity of the compounds did not correlate with stability as previously reported in literature. Our work shows that shorter excited-state lifetimes result in increased photo-oxidative stability in these rubrene derivatives. These results confirm that faster relaxation kinetics out-compete the formation of reactive oxygen species that ultimately degrade linear oligoacenes. This report highlights the importance of using molecular design to tune excited-state lifetimes in order to generate more stable oligoacenes.
CitationLy, J., Martin, K., Thomas, S., Yamashita, M., Yu, B., Pointer, C. A., … Briseno, A. L. (2019). Short Excited-State Lifetimes Enable Photo-Oxidatively Stable Rubrene Derivatives. The Journal of Physical Chemistry A, 123(35), 7558–7566. doi:10.1021/acs.jpca.9b04203
SponsorsA.L.B. acknowledges the Office of Naval Research (Award N00014-16-1-2612) and the National Science Foundation (DMR-1508627). The work at Georgia Tech was supported by the Office of Naval Research (Award N00014-17-1-2208). E.R.Y. thanks the NSF Major Research Instrumentation program for funds that established the multiuser laser facility for transient absorption (CHE-1428633). K.R.C. thanks the National Science Foundation (DMR-1506968) for support. S.P. thanks the NSF MRI program for awards CHE-0319176 and CHE-1625732
PublisherAmerican Chemical Society (ACS)
JournalJournal of Physical Chemistry A
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