Tran, Tinh Binh
KAUST DepartmentKing Abdullah University of Science and Technology (KAUST), Advanced Semiconductor Laboratory, Thuwal 23955, Saudi Arabia
Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Electrical Engineering Program
Embargo End Date2020-09-20
Permanent link to this recordhttp://hdl.handle.net/10754/656928
MetadataShow full item record
AbstractIn this Letter, we report on deep UV laser emitting at 249 nm based on thin GaN quantum wells (QWs) by optical pumping at room temperature. The laser threshold was 190 kW/cm2 that is comparable to state-of-the-art AlGaN QW lasers at similar wavelengths. The laser structure was pseudomorphically grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition, comprising 40 pairs of 4 monolayer (ML) GaN QWs sandwiched by 6 ML AlN quantum barriers (QBs). The low threshold at the wavelength was attributed to large optical and quantum confinement and high quality of the material, interface, and Fabry-Pérot facet. The emissions below and above the threshold were both dominated by transverse electric polarizations thanks to the valence band characteristics of GaN. This work unambiguously demonstrates the potentials of the binary AlN/GaN heterojunctions for high-performance UV emitters.
CitationShan, M., Zhang, Y., Tran, T. B., Jiang, J., Long, H., Zheng, Z., … Li, X. (2019). Deep UV Laser at 249 nm Based on GaN Quantum Wells. ACS Photonics. doi:10.1021/acsphotonics.9b00882
SponsorsThis work is supported by the National Key Research and Development Program of China (Grant No. 2016YFB0400901), the Key Laboratory of infrared imaging materials and detectors, Shanghai Institute of Technical Physics, Chinese Academy of Sciences (Grant No. IIMDKFJJ-17-09), the National Natural Science Foundation of China (Grant Nos. 61704062, 61774065, and 61704176), the China Postdoctoral Science Foundation (Grant No. 2016M602287), and the Director Fund of WNLO. The KAUST authors appreciate the support of KAUST Baseline BAS/1/1664-01-01, GCC Research Council REP/1/3189-01-01, and Competitive Research Grants URF/1/3437-01-01 and URF/1/3771-01-01.
PublisherAmerican Chemical Society (ACS)