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    AuthorZhang, Qiang (2)Zhang, Xixiang (2)Anthopoulos, Thomas D. (1)Ding, Bei (1)Faber, Hendrik (1)View MoreDepartmentImaging and Characterization Core Lab (2)Materials Science and Engineering Program (2)Nanofabrication Core Lab (2)Physical Sciences and Engineering (PSE) Division (2)Thin Films & Characterization (2)View MoreJournal
    Advanced Materials (2)
    KAUST Grant NumberCRF-2015-2549-CRG4 (1)PublisherWiley (2)SubjectElectron Mobility (1)Fe3sn2 (1)Heterojunction Transistors (1)Kagome Magnets (1)Metal oxides (1)View MoreTypeArticle (2)Year (Issue Date)
    2017 (2)
    Item AvailabilityOpen Access (2)

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    Modulation-Doped In2O3/ZnO Heterojunction Transistors Processed from Solution

    Khim, Dongyoon; Lin, Yen-Hung; Nam, Sungho; Faber, Hendrik; Tetzner, Kornelius; Li, Ruipeng; Zhang, Qiang; Li, Jun; Zhang, Xixiang; Anthopoulos, Thomas D. (Advanced Materials, Wiley, 2017-03-15) [Article]
    This paper reports the controlled growth of atomically sharp In2 O3 /ZnO and In2 O3 /Li-doped ZnO (In2 O3 /Li-ZnO) heterojunctions via spin-coating at 200 °C and assesses their application in n-channel thin-film transistors (TFTs). It is shown that addition of Li in ZnO leads to n-type doping and allows for the accurate tuning of its Fermi energy. In the case of In2 O3 /ZnO heterojunctions, presence of the n-doped ZnO layer results in an increased amount of electrons being transferred from its conduction band minimum to that of In2 O3 over the interface, in a process similar to modulation doping. Electrical characterization reveals the profound impact of the presence of the n-doped ZnO layer on the charge transport properties of the isotype In2 O3 /Li-ZnO heterojunctions as well as on the operating characteristics of the resulting TFTs. By judicious optimization of the In2 O3 /Li-ZnO interface microstructure, and Li concentration, significant enhancement in both the electron mobility and TFT bias stability is demonstrated.
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    Observation of Various and Spontaneous Magnetic Skyrmionic Bubbles at Room Temperature in a Frustrated Kagome Magnet with Uniaxial Magnetic Anisotropy

    Hou, Zhipeng; Ren, Weijun; Ding, Bei; Xu, Guizhou; Wang, Yue; Yang, Bing; Zhang, Qiang; Zhang, Ying; Liu, Enke; Xu, Feng; Wang, Wenhong; Wu, Guangheng; Zhang, Xixiang; Shen, Baogen; Zhang, Zhidong (Advanced Materials, Wiley, 2017-06-07) [Article]
    The quest for materials hosting topologically protected skyrmionic spin textures continues to be fueled by the promise of novel devices. Although many materials have demonstrated the existence of such spin textures, major challenges remain to be addressed before devices based on magnetic skyrmions can be realized. For example, being able to create and manipulate skyrmionic spin textures at room temperature is of great importance for further technological applications because they can adapt to various external stimuli acting as information carriers in spintronic devices. Here, the first observation of skyrmionic magnetic bubbles with variable topological spin textures formed at room temperature in a frustrated kagome Fe3 Sn2 magnet with uniaxial magnetic anisotropy is reported. The magnetization dynamics are investigated using in situ Lorentz transmission electron microscopy, revealing that the transformation between different magnetic bubbles and domains is via the motion of Bloch lines driven by an applied external magnetic field. These results demonstrate that Fe3 Sn2 facilitates a unique magnetic control of topological spin textures at room temperature, making it a promising candidate for further skyrmion-based spintronic devices.
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