High-temperature photocurrent mechanism of β-Ga2O3 based metal-semiconductor-metal solar-blind photodetectors
Type
ArticleAuthors
Tak, B. R.Garg, Manjari
Dewan, Sheetal
Torres-Castanedo, Carlos G.
Li, Kuang-Hui
Gupta, Vinay
Li, Xiaohang

Singh, R.
KAUST Department
Advanced Semiconductor LaboratoryComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Electrical Engineering Program
Material Science and Engineering Program
Physical Science and Engineering (PSE) Division
KAUST Grant Number
BAS/1/1664-01-01URF/1/3437-01-01
REP/1/3189-01-01
Date
2019-04-08Online Publication Date
2019-04-08Print Publication Date
2019-04-14Permanent link to this record
http://hdl.handle.net/10754/652844
Metadata
Show full item recordAbstract
High-temperature operation of metal–semiconductor–metal (MSM) UV photodetectors fabricated on pulsed laser deposited β-Ga2O3 thin films has been investigated. These photodetectors were operated up to 250 °C temperature under 255 nm illumination. The photo to dark current ratio of about 7100 was observed at room temperature and 2.3 at a high temperature of 250 °C with 10 V applied bias. A decline in photocurrent was observed until a temperature of 150 °C beyond which it increased with temperature up to 250 °C. The suppression of the UV and blue band was also observed in the normalized spectral response curve above 150 °C temperature. Temperature-dependent rise and decay times of temporal response were analyzed to understand the associated photocurrent mechanism at high temperatures. Electron–phonon interaction and self-trapped holes were found to influence the photoresponse in the devices. The obtained results are encouraging and significant for high-temperature applications of β-Ga2O3 MSM deep UV photodetectors.Citation
Tak BR, Garg M, Dewan S, Torres-Castanedo CG, Li K-H, et al. (2019) High-temperature photocurrent mechanism of β-Ga2O3 based metal-semiconductor-metal solar-blind photodetectors. Journal of Applied Physics 125: 144501. Available: http://dx.doi.org/10.1063/1.5088532.Sponsors
B.R.T. and R.S. would like to thank the Department of Physics, IIT Delhi (IITD), for providing XRD facility. We would also like to acknowledge the Nanoscale Research Facility (NRF), IITD, for device fabrication and characterizations. The Department of Science and Technology (DST), India, is highly appreciated for awarding INSPIRE research fellowship to B.R.T. for the Ph.D. programme. The IITD authors acknowledge the NRF project (No. NRF/RP02395) for research support. The KAUST authors are thankful for the support of KAUST baseline fund (No. BAS/1/1664-01-01), KAUST CRG (No. URF/1/3437-01-01), and GCC Research Council (No. REP/1/3189-01-01).Publisher
AIP PublishingJournal
Journal of Applied PhysicsAdditional Links
https://aip.scitation.org/doi/10.1063/1.5088532ae974a485f413a2113503eed53cd6c53
10.1063/1.5088532