Method for preparing microstructure arrays on the surface of thin film material
Type
PatentPatent Status
Published ApplicationAuthors
Wang, Peng
Tang, Bo

Zhang, Lianbin

KAUST Department
Biological and Environmental Sciences and Engineering (BESE) DivisionEnvironmental Science and Engineering Program
Water Desalination and Reuse Research Center (WDRC)
Date
2018-06-13Submitted Date
2016-08-05Permanent link to this record
http://hdl.handle.net/10754/630911
Metadata
Show full item recordAbstract
Methods are provided for growing a thin film of a nanoscale material. Thin films of nanoscale materials are also provided. The films can be grown with microscale patterning. The method can include vacuum filtration of a solution containing the nanostructured material through a porous substrate. The porous substrate can have a pore size that is comparable to the size of the nanoscale material. By patterning the pores on the surface of the substrate, a film can be grown having the pattern on a surface of the thin film, including on the top surface opposite the substrate. The nanoscale material can be graphene, graphene oxide, reduced graphene oxide, molybdenum disulfide, hexagonal boron nitride, tungsten diselenide, molybdenum trioxide, or clays such as montmorillonite or lapnotie. The porous substrate can be a porous organic or inorganic membrane, a silicon stencil membrane, or similar membrane having pore sizes on the order of microns.Application Number
WO2017021936A1EP3331823A1