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    Enhanced Carrier Transport and Bandgap Reduction in Sulfur-Modified BiVO4 Photoanodes

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    M.Harb_Chem.Mater_30_8630_18.pdf
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    Description:
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    Type
    Article
    Authors
    Lamers, Marlene
    Li, Wenjie
    Favaro, Marco cc
    Starr, David E. cc
    Friedrich, Dennis
    Lardhi, Sheikha F. cc
    Cavallo, Luigi cc
    Harb, Moussab cc
    van de Krol, Roel
    Wong, Lydia H. cc
    Abdi, Fatwa F. cc
    KAUST Department
    Chemical Science Program
    KAUST Catalysis Center (KCC)
    Physical Science and Engineering (PSE) Division
    Date
    2018-11-21
    Online Publication Date
    2018-11-21
    Print Publication Date
    2018-12-11
    Permanent link to this record
    http://hdl.handle.net/10754/630318
    
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    Abstract
    Recent progress on bismuth vanadate (BiVO) has shown it to be among the highest performing metal oxide photoanode materials. However, further improvement, especially in the form of thin film photoelectrodes, is hampered by its poor charge carrier transport and its relatively wide bandgap. Here, sulfur incorporation is used to address these limitations. A maximum bandgap decrease of ∼0.3 eV is obtained, which increases the theoretical maximum solar-to-hydrogen efficiency from 9 to 12%. Hard X-ray photoelectron spectroscopy measurements as well as density functional theory calculations show that the main reason for the bandgap decrease is an upward shift of the valence band maximum. Time-resolved microwave conductivity measurements reveal a ∼3 times higher charge carrier mobility compared to unmodified BiVO, resulting in a ∼70% increase in the carrier diffusion length. This work demonstrates that sulfur incorporation can be a promising and practical method to improve the performance of wide-bandgap metal oxide photoelectrodes.
    Citation
    Lamers M, Li W, Favaro M, Starr DE, Friedrich D, et al. (2018) Enhanced Carrier Transport and Bandgap Reduction in Sulfur-Modified BiVO4 Photoanodes. Chemistry of Materials 30: 8630–8638. Available: http://dx.doi.org/10.1021/acs.chemmater.8b03859.
    Sponsors
    We acknowledge Sebastian Schmidt and Sonja Cinque for the assistance with XRF measurements. S.L., L.C., and M.H. thank the KAUST Supercomputing Laboratory for giving the needed computational resources.
    Publisher
    American Chemical Society (ACS)
    Journal
    Chemistry of Materials
    DOI
    10.1021/acs.chemmater.8b03859
    Additional Links
    https://pubs.acs.org/doi/10.1021/acs.chemmater.8b03859
    ae974a485f413a2113503eed53cd6c53
    10.1021/acs.chemmater.8b03859
    Scopus Count
    Collections
    Articles; Physical Science and Engineering (PSE) Division; Chemical Science Program; KAUST Catalysis Center (KCC)

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