Enhanced Carrier Transport and Bandgap Reduction in Sulfur-Modified BiVO4 Photoanodes
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ArticleAuthors
Lamers, MarleneLi, Wenjie
Favaro, Marco

Starr, David E.

Friedrich, Dennis
Lardhi, Sheikha F.

Cavallo, Luigi

Harb, Moussab

van de Krol, Roel
Wong, Lydia H.

Abdi, Fatwa F.

KAUST Department
Chemical Science ProgramKAUST Catalysis Center (KCC)
Physical Science and Engineering (PSE) Division
Date
2018-11-21Online Publication Date
2018-11-21Print Publication Date
2018-12-11Permanent link to this record
http://hdl.handle.net/10754/630318
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Recent progress on bismuth vanadate (BiVO) has shown it to be among the highest performing metal oxide photoanode materials. However, further improvement, especially in the form of thin film photoelectrodes, is hampered by its poor charge carrier transport and its relatively wide bandgap. Here, sulfur incorporation is used to address these limitations. A maximum bandgap decrease of ∼0.3 eV is obtained, which increases the theoretical maximum solar-to-hydrogen efficiency from 9 to 12%. Hard X-ray photoelectron spectroscopy measurements as well as density functional theory calculations show that the main reason for the bandgap decrease is an upward shift of the valence band maximum. Time-resolved microwave conductivity measurements reveal a ∼3 times higher charge carrier mobility compared to unmodified BiVO, resulting in a ∼70% increase in the carrier diffusion length. This work demonstrates that sulfur incorporation can be a promising and practical method to improve the performance of wide-bandgap metal oxide photoelectrodes.Citation
Lamers M, Li W, Favaro M, Starr DE, Friedrich D, et al. (2018) Enhanced Carrier Transport and Bandgap Reduction in Sulfur-Modified BiVO4 Photoanodes. Chemistry of Materials 30: 8630–8638. Available: http://dx.doi.org/10.1021/acs.chemmater.8b03859.Sponsors
We acknowledge Sebastian Schmidt and Sonja Cinque for the assistance with XRF measurements. S.L., L.C., and M.H. thank the KAUST Supercomputing Laboratory for giving the needed computational resources.Publisher
American Chemical Society (ACS)Journal
Chemistry of MaterialsAdditional Links
https://pubs.acs.org/doi/10.1021/acs.chemmater.8b03859ae974a485f413a2113503eed53cd6c53
10.1021/acs.chemmater.8b03859