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dc.contributor.authorZhang, Bo
dc.contributor.authorZheng, Tao
dc.contributor.authorWang, Qingxiao
dc.contributor.authorGuo, Zaibing
dc.contributor.authorKim, Moon J.
dc.contributor.authorAlshareef, Husam N.
dc.contributor.authorGnade, Bruce E.
dc.date.accessioned2018-04-24T07:48:29Z
dc.date.available2018-04-24T07:48:29Z
dc.date.issued2018-04-14
dc.identifier.citationZhang B, Zheng T, Wang Q, Guo Z, Kim MJ, et al. (2018) Stable and low contact resistance electrical contacts for high temperature SiGe thermoelectric generators. Scripta Materialia 152: 36–39. Available: http://dx.doi.org/10.1016/j.scriptamat.2018.03.040.
dc.identifier.issn1359-6462
dc.identifier.doi10.1016/j.scriptamat.2018.03.040
dc.identifier.urihttp://hdl.handle.net/10754/627635
dc.description.abstractThe thermal stability and contact resistance of TaAlN thin films as electrical contacts to SiGe thermoelectric elements are reported. We demonstrate that a sharp interface is maintained after the device annealed at 800°C for over 100h, indicating that no interdiffusion takes place between TaAlN and SiGe. A specific contact resistivity of (2.1±1.3)×10−6Ω-cm2 for p-type SiGe and (2.8±1.6)×10−5 Ω-cm2 for n-type SiGe is demonstrated after the high temperature annealing. These results show that TaAlN is a promising contact material for high temperature thermoelectrics such as SiGe.
dc.description.sponsorshipThe research was partially financially supported by the University of Texas at Dallas. The authors acknowledge Dr. Gordon Pollock, Mr. Wallace Martin and Mr. Zane Borg for help with thin-film preparation.
dc.publisherElsevier BV
dc.relation.urlhttp://www.sciencedirect.com/science/article/pii/S1359646218302021
dc.subjectThermoelectric materials
dc.subjectSputtering
dc.subjectAnnealing
dc.subjectRefractory metals
dc.subjectElectrical contacts
dc.titleStable and low contact resistance electrical contacts for high temperature SiGe thermoelectric generators
dc.typeArticle
dc.contributor.departmentFunctional Nanomaterials and Devices Research Group
dc.contributor.departmentMaterial Science and Engineering Program
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.contributor.departmentThin Films & Characterization
dc.identifier.journalScripta Materialia
dc.contributor.institutionMaterials Science and Engineering Department, University of Texas at Dallas, Richardson, TX 75080, USA
dc.contributor.institutionLyle School of Engineering, Southern Methodist University, Dallas, TX 75275, USA
kaust.personGuo, Zaibing
kaust.personAlshareef, Husam N.
dc.date.published-online2018-04-14
dc.date.published-print2018-07


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