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dc.contributor.authorWei, Binbin
dc.contributor.authorLiang, Hanfeng
dc.contributor.authorZhang, Dongfang
dc.contributor.authorQi, Zhengbing
dc.contributor.authorShen, Hao
dc.contributor.authorWang, Zhoucheng
dc.date.accessioned2018-04-16T11:27:43Z
dc.date.available2018-04-16T11:27:43Z
dc.date.issued2018-04-09
dc.identifier.citationWei B, Liang H, Zhang D, Qi Z, Shen H, et al. (2018) Magnetron sputtered TiN thin films toward enhanced performance supercapacitor electrodes. Materials for Renewable and Sustainable Energy 7. Available: http://dx.doi.org/10.1007/s40243-018-0117-9.
dc.identifier.issn2194-1459
dc.identifier.issn2194-1467
dc.identifier.doi10.1007/s40243-018-0117-9
dc.identifier.urihttp://hdl.handle.net/10754/627523
dc.description.abstractSupercapacitors as a new type of energy storage devices bridging the gap between conventional capacitors and batteries have aroused widespread concern. Herein, binder-free titanium nitride (TiN) thin film electrodes for supercapacitors prepared by reactive magnetron sputtering technology are reported. The effect of N2 content on the supercapacitor performance is evaluated. A highest specific capacitance of 27.3 mF cm−2 at a current density of 1.0 mA cm−2, together with excellent cycling performance (98.2% capacitance retention after 20,000 cycles at 2.0 mA cm−2) is achieved in a 0.5 M H2SO4 aqueous electrolyte. More importantly, a symmetric supercapacitor device assembled on the basis of TiN thin films can deliver a maximum energy density of 17.6 mWh cm−3 at a current density of 0.2 mA cm−2 and a maximum power density of 10.8 W cm−3 at a current density of 2 mA cm−2 with remarkable cycling stability. As a consequence, TiN thin films demonstrate great potential as promising supercapacitor electrode materials.
dc.description.sponsorshipThis research is financially supported by the National Nature Science Foundation of China (Nos. 51372212, 51601163).
dc.publisherSpringer Nature
dc.relation.urlhttps://link.springer.com/article/10.1007%2Fs40243-018-0117-9
dc.rightsThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.
dc.rights.urihttp://creativecommons.org/licenses/by/4.0/
dc.subjectSupercapacitor
dc.subjectEnergy storage
dc.subjectTitanium nitride
dc.subjectMagnetron sputtering
dc.titleMagnetron sputtered TiN thin films toward enhanced performance supercapacitor electrodes
dc.typeArticle
dc.contributor.departmentMaterial Science and Engineering Program
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.identifier.journalMaterials for Renewable and Sustainable Energy
dc.eprint.versionPublisher's Version/PDF
dc.contributor.institutionCollege of Chemistry and Chemical Engineering, Xiamen University, Xiamen, China
dc.contributor.institutionSchool of Materials Science and Engineering, Xiamen University of Technology, Xiamen, China
kaust.personLiang, Hanfeng
refterms.dateFOA2018-06-14T04:21:24Z
dc.date.published-online2018-04-09
dc.date.published-print2018-05


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This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.
Except where otherwise noted, this item's license is described as This article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.