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dc.contributor.authorTu, Kun-Hua
dc.contributor.authorFernandez Martin, Eduardo
dc.contributor.authoralmasi, hamid
dc.contributor.authorWang, Weigang
dc.contributor.authorNavas Otero, David
dc.contributor.authorNtetsikas, Konstantinos
dc.contributor.authorMoschovas, Dimitrios
dc.contributor.authorAvgeropoulos, Apostolos
dc.contributor.authorRoss, Caroline A
dc.date.accessioned2018-04-16T11:27:43Z
dc.date.available2018-04-16T11:27:43Z
dc.date.issued2018-05-08
dc.identifier.citationTu K-H, Fernandez Martin E, almasi hamid, Wang W, Navas Otero D, et al. (2018) Magnetic Reversal and Thermal Stability of CoFeB Perpendicular Magnetic Tunnel Junction Arrays Patterned by Block Copolymer Lithography. Nanotechnology. Available: http://dx.doi.org/10.1088/1361-6528/aabce8.
dc.identifier.issn0957-4484
dc.identifier.issn1361-6528
dc.identifier.pmid29633719
dc.identifier.doi10.1088/1361-6528/aabce8
dc.identifier.urihttp://hdl.handle.net/10754/627522
dc.description.abstractDense arrays of pillars, with diameters of 64 and 25 nm, were made from a perpendicular CoFeB magnetic tunnel junction thin film stack using block copolymer lithography. While the soft layer and hard layer in the 64 nm pillars reverse at different fields, the reversal of the two layers in the 25 nm pillars could not be distinguished, attributed to the strong interlayer magnetostatic coupling. First order reversal curves were used to identify the steps that occur during switching, and the thermal stability and effective switching volume were determined from scan rate dependent hysteresis measurements.
dc.description.sponsorshipC-SPIN, a STARnet Center of DARPA and MARCO
dc.publisherIOP Publishing
dc.relation.urlhttp://iopscience.iop.org/article/10.1088/1361-6528/aabce8
dc.rightsThis is an author-created, un-copyedited version of an article accepted for publication/published in Nanotechnology. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at http://doi.org/10.1088/1361-6528/aabce8
dc.subjectNanolithography
dc.subjectNanomagnetism
dc.subjectMagnetic Tunnel Junction
dc.titleMagnetic Reversal and Thermal Stability of CoFeB Perpendicular Magnetic Tunnel Junction Arrays Patterned by Block Copolymer Lithography
dc.typeArticle
dc.contributor.departmentKAUST Catalysis Center (KCC)
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.identifier.journalNanotechnology
dc.eprint.versionPost-print
dc.contributor.institutionMaterials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Bldg.13-4025, Cambridge, Massachusetts, 02139, UNITED STATES.
dc.contributor.institutionDepartment of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, UNITED STATES.
dc.contributor.institutionPhysics, University of Arizona, 1118 E 4st St, Tucson, Arizona, 85721-0001, UNITED STATES.
dc.contributor.institutionPhysics, University of Arizona, Tucson, Arizona, UNITED STATES.
dc.contributor.institutionUniversidade do Porto Instituto de Fisica dos Materiais Instituto de Nanociencia e Nanotecnologia, Porto, PORTUGAL.
dc.contributor.institutionMaterials Science Engineering, University of Ioannina, Ioannina, GREECE.
dc.contributor.institutionDepartment of Materials Science and Engineering, Massachusetts Institute of Technology, 77 Massachusetts Avenue, Cambridge, MA 02139, USA, UNITED STATES.
kaust.personNtetsikas, Konstantinos
refterms.dateFOA2019-04-10T00:00:00Z
dc.date.published-online2018-05-08
dc.date.published-print2018-07-06


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