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dc.contributor.authorWei, Binbin
dc.contributor.authorMei, Gui
dc.contributor.authorLiang, Hanfeng
dc.contributor.authorQi, Zhengbing
dc.contributor.authorZhang, Dongfang
dc.contributor.authorShen, Hao
dc.contributor.authorWang, Zhoucheng
dc.date.accessioned2018-04-15T07:13:36Z
dc.date.available2018-04-15T07:13:36Z
dc.date.issued2018-03-18
dc.identifier.citationWei B, Mei G, Liang H, Qi Z, Zhang D, et al. (2018) Porous CrN thin films by selectively etching CrCuN for symmetric supercapacitors. Journal of Power Sources 385: 39–44. Available: http://dx.doi.org/10.1016/j.jpowsour.2018.03.023.
dc.identifier.issn0378-7753
dc.identifier.doi10.1016/j.jpowsour.2018.03.023
dc.identifier.urihttp://hdl.handle.net/10754/627464
dc.description.abstractTransition metal nitrides are regarded as a new class of excellent electrode materials for high-performance supercapacitors due to their superior chemical stability and excellent electrical conductivity. We synthesize successfully the porous CrN thin films for binder-free supercapacitor electrodes by reactive magnetron co-sputtering and selective chemical etching. The porous CrN thin film electrodes exhibit high-capacitance performance (31.3 mF cm−2 at 1.0 mA cm−2) and reasonable cycling stability (94% retention after 20000 cycles). Moreover, the specific capacitance is more than two-fold higher than that of the CrN thin film electrodes in previous work. In addition, a symmetric supercapacitor device with a maximum energy density of 14.4 mWh cm−3 and a maximum power density of 6.6 W cm−3 is achieved. These findings demonstrate that the porous CrN thin films will have potential applications in supercapacitors.
dc.description.sponsorshipThis work was financially supported by the National Nature Science Foundation of China (No. 51372212).
dc.publisherElsevier BV
dc.relation.urlhttp://www.sciencedirect.com/science/article/pii/S0378775318302477
dc.subjectTransition metal nitride
dc.subjectPorous CrN thin film
dc.subjectMagnetron co-sputtering
dc.subjectSelective chemical etching
dc.subjectSymmetric supercapacitor
dc.titlePorous CrN thin films by selectively etching CrCuN for symmetric supercapacitors
dc.typeArticle
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Division
dc.contributor.departmentMaterials Science and Engineering Program
dc.identifier.journalJournal of Power Sources
dc.contributor.institutionCollege of Chemistry and Chemical Engineering, Xiamen University, Xiamen 361005, People's Republic of China
dc.contributor.institutionSchool of Materials Science and Engineering, Xiamen University of Technology, Xiamen 361024, People's Republic of China
kaust.personLiang, Hanfeng


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