Chemical hole doping into large-area transition metal dichalcogenide monolayers using boron-based oxidant
Type
ArticleAuthors
Matsuoka, HirofumiKanahashi, Kaito
Tanaka, Naoki
Shoji, Yoshiaki
Li, Lain-Jong
Pu, Jiang
Ito, Hiroshi
Ohta, Hiromichi
Fukushima, Takanori
Takenobu, Taishi
KAUST Department
Material Science and Engineering ProgramPhysical Science and Engineering (PSE) Division