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dc.contributor.authorSingh, Devendra
dc.contributor.authorKumar, Ravi
dc.contributor.authorGanguli, Tapas
dc.contributor.authorMajor, Syed S
dc.date.accessioned2017-08-30T11:40:25Z
dc.date.available2017-08-30T11:40:25Z
dc.date.issued2017-09-07
dc.identifier.citationSingh D, Kumar R, Ganguli T, Major SS (2017) High resolution x-ray diffraction study of the substrate temperature and thickness dependent microstructure of reactively sputtered epitaxial ZnO films. Materials Research Express. Available: http://dx.doi.org/10.1088/2053-1591/aa885e.
dc.identifier.issn2053-1591
dc.identifier.doi10.1088/2053-1591/aa885e
dc.identifier.urihttp://hdl.handle.net/10754/625423
dc.description.abstractEpitaxial ZnO films were grown on c-sapphire by reactive sputtering of zinc target in Ar-O2 mixture. High resolution X-ray diffraction measurements were carried out to obtain lateral and vertical coherence lengths, crystallite tilt and twist, micro-strain and densities of screw and edge dislocations in epilayers of different thickness (25 - 200 nm) and those grown at different temperatures (100 - 500 °C). phgr-scans indicate epitaxial growth in all the cases, although epilayers grown at lower substrate temperatures (100 °C and 200 °C) and those of smaller thickness (25 nm and 50 nm) display inferior microstructural parameters. This is attributed to the dominant presence of initially grown strained 2D layer and subsequent transition to an energetically favorable mode. With increase in substrate temperature, the transition shifts to lower thickness and growth takes place through the formation of 2D platelets with intermediate strain, over which 3D islands grow. Consequently, 100 nm thick epilayers grown at 300 °C display the best microstructural parameters (micro-strain ~1.2 x 10-3, screw and edge dislocation densities ~1.5 x 1010 cm-2 and ~2.3 x 1011 cm-2, respectively). A marginal degradation of microstructural parameters is seen in epilayers grown at higher substrate temperatures, due to the dominance of 3D hillock type growth.
dc.description.sponsorshipThe authors would like to thank Prof. Raman Srinivasa for his keen interest in this work and helpful discussions.
dc.publisherIOP Publishing
dc.relation.urlhttp://iopscience.iop.org/article/10.1088/2053-1591/aa885e
dc.rightsThis is an author-created, un-copyedited version of an article accepted for publication/published in Materials Research Express. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at http://doi.org/10.1088/2053-1591/aa885e. As the Version of Record of this article is going to be/has been published on a subscription basis, this Accepted Manuscript will be available for reuse under a CC BY-NC-ND 3.0 licence after a 12 month embargo period.
dc.titleHigh resolution x-ray diffraction study of the substrate temperature and thickness dependent microstructure of reactively sputtered epitaxial ZnO films
dc.typeArticle
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.identifier.journalMaterials Research Express
dc.eprint.versionPost-print
dc.contributor.institutionMaterials Science Section, Raja Ramanna Centre for Advanced Technology, Indore, Madhya Pradesh, INDIA
dc.contributor.institutionSynchrotron Utilization Section, Raja Ramanna Centre for Advanced Technology, Indore, INDIA
dc.contributor.institutionDepartment of Physics, Indian Institute of Technology Bombay, Mumbai, Maharashtra, INDIA
kaust.personSingh, Devendra
refterms.dateFOA2018-08-24T00:00:00Z


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