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dc.contributor.authorWang, Peng
dc.contributor.authorTang, Bo
dc.contributor.authorZhang, Lianbin
dc.date.accessioned2017-06-14T14:14:19Z
dc.date.available2017-06-14T14:14:19Z
dc.date.issued2017-02-09
dc.date.submitted2015-08-06
dc.identifier.urihttp://hdl.handle.net/10754/625037
dc.description.abstractMethods are provided for growing a thin film of a nanoscale material. Thin films of nanoscale materials are also provided. The films can be grown with microscale patterning. The method can include vacuum filtration of a solution containing the nanostructured material through a porous substrate. The porous substrate can have a pore size that is comparable to the size of the nanoscale material. By patterning the pores on the surface of the substrate, a film can be grown having the pattern on a surface of the thin film, including on the top surface opposite the substrate. The nanoscale material can be graphene, graphene oxide, reduced graphene oxide, molybdenum disulfide, hexagonal boron nitride, tungsten diselenide, molybdenum trioxide, or clays such as montmorillonite or lapnotie. The porous substrate can be a porous organic or inorganic membrane, a silicon stencil membrane, or similar membrane having pore sizes on the order of microns.
dc.relation.urlhttp://www.google.com/patents/WO2017021936A1
dc.relation.urlhttp://worldwide.espacenet.com/publicationDetails/biblio?CC=WO&NR=2017021936A1&KC=A1&FT=D
dc.titleMethod for preparing microstructure arrays on the surface of thin film material
dc.typePatent
dc.contributor.departmentBiological and Environmental Sciences and Engineering (BESE) Division
dc.description.statusPublished Application
dc.contributor.assigneeKing Abdullah University Of Science And Technology
dc.description.countryWorld Intellectual Property Organization (WIPO)
dc.identifier.applicationnumberWO 2017021936 A1
refterms.dateFOA2018-06-13T11:05:21Z


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