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dc.contributor.authorYu, Liyang
dc.contributor.authorAmassian, Aram
dc.date.accessioned2017-01-19T07:08:45Z
dc.date.available2017-01-19T07:08:45Z
dc.date.issued2016-12-15
dc.date.submitted2015-06-15
dc.identifier.urihttp://hdl.handle.net/10754/622699
dc.description.abstractA method of manufacturing a patterned crystal structure for includes depositing an amorphous material. The amorphous material is modified such that a first portion of the amorphous thin-film layer has a first height/volume and a second portion of the amorphous thin-film layer has a second height/volume greater than the first portion. The amorphous material is annealed to induce crystallization, wherein crystallization is induced in the second portion first due to the greater height/volume of the second portion relative to the first portion to form patterned crystal structures.
dc.relation.urlhttp://www.google.com/patents/WO2016199093A1
dc.relation.urlhttp://worldwide.espacenet.com/publicationDetails/biblio?CC=WO&NR=2016199093A1&KC=A1&FT=D
dc.titleMethod of fabricating patterned crystal structures
dc.typePatent
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.description.statusPublished Application
dc.contributor.assigneeKing Abdullah University Of Science And Technology
dc.description.countryWorld Intellectual Property Organization (WIPO)
dc.identifier.applicationnumberWO 2016199093 A1
refterms.dateFOA2018-06-13T17:16:51Z


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