Performance enhancement of electronic sensor through mask-less lithography
KAUST DepartmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Electrical Engineering Program
Sensing, Magnetism and Microsystems Lab
Online Publication Date2016-03-30
Print Publication Date2015-12
Permanent link to this recordhttp://hdl.handle.net/10754/622584
MetadataShow full item record
AbstractThe escalating applications of miniaturized sensors have led the microelectronics industry to stay abreast with the precise micro-fabrication technologies. The following article describes a new technique for the fabrication of miniaturized interdigitated capacitive sensors that own highly sensitive and real-time detections capabilities. In standard lithographic procedure, the sensors are fabricated applying different photoresist materials that give rise to the variable characteristic profile of the fabricated product. Single crystal p-doped Silicon wafer was used as a substrate material due to its advantageous properties over Germanium. Heidelberg system was used for the maskless lithographic patterning of the new interdigital sensors on a silicon substrate. The process was carried out in a clean room in the absence of ultraviolet light at a fixed temperature. The fabricated sensors were used for inflammable gas sensing application. Electrochemical Impedance Spectroscopy was applied to read the resistive and capacitive impedance measured by the sensor. The results proclaimed that the fabricated sensors own better performance in LPG detection as compared to its commercial counterparts.
CitationNag A, Zia AI, Mukhopadhyay SC, Kosel J (2015) Performance enhancement of electronic sensor through mask-less lithography. 2015 9th International Conference on Sensing Technology (ICST). Available: http://dx.doi.org/10.1109/ICSensT.2015.7438426.
Conference/Event name9th International Conference on Sensing Technology, ICST 2015