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    Contact resistance and stability study for Au, Ti, Hf and Ni contacts on thin-film Mg2Si

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    Type
    Article
    Authors
    Zhang, Bo
    Zheng, Tao
    Wang, Qingxiao
    Zhu, Yihan
    Alshareef, Husam N. cc
    Kim, Moon J.
    Gnade, Bruce E.
    KAUST Department
    Advanced Membranes and Porous Materials Research Center
    Functional Nanomaterials and Devices Research Group
    Material Science and Engineering Program
    Physical Science and Engineering (PSE) Division
    Date
    2016-12-28
    Online Publication Date
    2016-12-28
    Print Publication Date
    2017-03
    Permanent link to this record
    http://hdl.handle.net/10754/622082
    
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    Abstract
    We present a detailed study of post-deposition annealing effects on contact resistance of Au, Ti, Hf and Ni electrodes on Mg2Si thin films. Thin-film Mg2Si and metal contacts were deposited using magnetron sputtering. Various post-annealing temperatures were studied to determine the thermal stability of each contact metal. The specific contact resistivity (SCR) was determined using the Cross Bridge Kelvin Resistor (CBKR) method. Ni contacts exhibits the best thermal stability, maintaining stability up to 400 °C, with a SCR of approximately 10−2 Ω-cm2 after annealing. The increased SCR after high temperature annealing is correlated with the formation of a Mg-Si-Ni mixture identified by cross-sectional scanning transmission electron microscopy (STEM) characterization, X-ray diffraction characterization (XRD) and other elemental analyses. The formation of this Mg-Si-Ni mixture is attributed to Ni diffusion and its reaction with the Mg2Si film.
    Citation
    Zhang B, Zheng T, Wang Q, Zhu Y, Alshareef HN, et al. (2016) Contact resistance and stability study for Au, Ti, Hf and Ni contacts on thin-film Mg2Si. Journal of Alloys and Compounds. Available: http://dx.doi.org/10.1016/j.jallcom.2016.12.229.
    Sponsors
    This work is partially supported by the II-VI foundation. The authors would like to thank Wallace Martin, Gordon Pollack and John Maynard from the University of Texas at Dallas cleanroom.
    Publisher
    Elsevier BV
    Journal
    Journal of Alloys and Compounds
    DOI
    10.1016/j.jallcom.2016.12.229
    Additional Links
    http://www.sciencedirect.com/science/article/pii/S0925838816341457
    ae974a485f413a2113503eed53cd6c53
    10.1016/j.jallcom.2016.12.229
    Scopus Count
    Collections
    Articles; Advanced Membranes and Porous Materials Research Center; Physical Science and Engineering (PSE) Division; Material Science and Engineering Program

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