Dependency of the band gap of electrodeposited Copper oxide thin films on the concentration of copper sulfate (CuSO4.5H2O) and pH in bath solution for photovoltaic applications
AuthorsIslam, Md. Anisul
Nurani, Sheikh Jaber
Karim, Md. Adnan
Rahman, Abu Sadat Md. Sayem
Abdul Halim, Md. Md. Ansar Ali
KAUST DepartmentMaterials Science and Engineering Program
Permanent link to this recordhttp://hdl.handle.net/10754/621354
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AbstractIn this study, Copper oxide thin films were deposited on copper plate by electrodeposition process in an electrolytic bath containing CuSO4.5H2O, 3M lactic acid and NaOH. Copper oxide films were electrodeposited at different pH and different concentration of CuSO4.5H2O and the optical band gap was determined from their absorption spectrum which was obtained from UV-Vis absorption spectroscopy. It was found that copper oxide films which were deposited at low concentration of CuSO4.5H2O have higher band gap than those deposited at higher bath concentration. The band gap of copper oxide films also significantly changes with pH of the bath solution. It was also observed that with the increase of the pH of bath solution band gap of copper oxide film decreased. © 2015 IEEE.
CitationIslam MA, Nurani SJ, Karim MA, Rahman ASMS, Halim MA (2015) Dependency of the band gap of electrodeposited Copper oxide thin films on the concentration of copper sulfate (CuSO4.5H2O) and pH in bath solution for photovoltaic applications. 2015 International Conference on Electrical & Electronic Engineering (ICEEE). Available: http://dx.doi.org/10.1109/CEEE.2015.7428263.
Conference/Event name1st International Conference on Electrical and Electronic Engineering, ICEEE 2015