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dc.contributor.authorSelzer, Franz
dc.contributor.authorFloresca, Carlo
dc.contributor.authorKneppe, David
dc.contributor.authorBormann, Ludwig
dc.contributor.authorSachse, Christoph
dc.contributor.authorWeiß, Nelli
dc.contributor.authorEychmüller, Alexander
dc.contributor.authorAmassian, Aram
dc.contributor.authorMüller-Meskamp, Lars
dc.contributor.authorLeo, Karl
dc.date.accessioned2016-04-25T13:54:39Z
dc.date.available2016-04-25T13:54:39Z
dc.date.issued2016-04-19
dc.identifier.citationElectrical limit of silver nanowire electrodes: Direct measurement of the nanowire junction resistance 2016, 108 (16):163302 Applied Physics Letters
dc.identifier.issn0003-6951
dc.identifier.issn1077-3118
dc.identifier.doi10.1063/1.4947285
dc.identifier.urihttp://hdl.handle.net/10754/606961
dc.description.abstractWe measure basic network parameters of silvernanowire (AgNW) networks commonly used as transparent conductingelectrodes in organic optoelectronic devices. By means of four point probing with nanoprobes, the wire-to-wire junction resistance and the resistance of single nanowires are measured. The resistanceRNW of a single nanowire shows a value of RNW=(4.96±0.18) Ω/μm. The junction resistanceRJ differs for annealed and non-annealed NW networks, exhibiting values of RJ=(25.2±1.9) Ω (annealed) and RJ=(529±239) Ω (non-annealed), respectively. Our simulation achieves a good agreement between the measured network parameters and the sheet resistanceRS of the entire network. Extrapolating RJ to zero, our study show that we are close to the electrical limit of the conductivity of our AgNW system: We obtain a possible RS reduction by only ≈20% (common RS≈10 Ω/sq). Therefore, we expect further performance improvements in AgNW systems mainly by increasing NW length or by utilizing novel network geometries.
dc.description.sponsorshipThis work was funded by the European Community’s Seventh Framework Program (FP7/2007-2013) under Grant Agreement No. 314068 and within the DFG Cluster of Excellence “Center for Advancing Electronics Dresden.”
dc.language.isoen
dc.publisherAIP Publishing
dc.relation.urlhttp://scitation.aip.org/content/aip/journal/apl/108/16/10.1063/1.4947285
dc.rightsArchived with thanks to Applied Physics Letters
dc.titleElectrical limit of silver nanowire electrodes: Direct measurement of the nanowire junction resistance
dc.typeArticle
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Division
dc.identifier.journalApplied Physics Letters
dc.eprint.versionPublisher's Version/PDF
dc.contributor.institutionInstitut für Angewandte Photophysik (IAPP), Technische Universität Dresden, D-01062 Dresden, Germany
dc.contributor.institutionNanoInstruments Division, DCG Systems, Richardson, Texas 75081, USA
dc.contributor.institutionPhysikalische Chemie, Technische Universität Dresden, D-01062 Dresden, Germany
dc.contributor.institutionCanadian Institute for Advanced Research (CIFAR), Toronto, Ontario CA-M5G 1Z8, Canada
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)
kaust.personAmassian, Aram
refterms.dateFOA2018-06-13T11:44:34Z


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