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    Wafer-Scale High-Throughput Ordered Growth of Vertically Aligned ZnO Nanowire Arrays

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    Type
    Article
    Authors
    Wei, Yaguang
    Wu, Wenzhuo
    Guo, Rui
    Yuan, Dajun
    Das, Suman
    Wang, Zhong Lin cc
    KAUST Grant Number
    DMS0706436
    CMMI 0403671
    Date
    2010-09-08
    Permanent link to this record
    http://hdl.handle.net/10754/600180
    
    Metadata
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    Abstract
    This article presents an effective approach for patterned growth of vertically aligned ZnO nanowire (NW) arrays with high throughput and low cost at wafer scale without using cleanroom technology. Periodic hole patterns are generated using laser interference lithography on substrates coated with the photoresist SU-8. ZnO NWs are selectively grown through the holes via a low-temperature hydrothermal method without using a catalyst and with a superior control over orientation, location/density, and as-synthesized morphology. The development of textured ZnO seed layers for replacing single crystalline GaN and ZnO substrates extends the large-scale fabrication of vertically aligned ZnO NW arrays on substrates of other materials, such as polymers, Si, and glass. This combined approach demonstrates a novel method of manufacturing large-scale patterned one-dimensional nanostructures on various substrates for applications in energy harvesting, sensing, optoelectronics, and electronic devices. © 2010 American Chemical Society.
    Citation
    Wei Y, Wu W, Guo R, Yuan D, Das S, et al. (2010) Wafer-Scale High-Throughput Ordered Growth of Vertically Aligned ZnO Nanowire Arrays. Nano Lett 10: 3414–3419. Available: http://dx.doi.org/10.1021/nl1014298.
    Sponsors
    Research was supported by DARPA (Army/AMCOM/REDSTONE AR, W31P4Q-08-1-0009), BES DOE (DE-FG02-07ER46394), KAUST Global Research Partnership, NSF (DMS0706436, CMMI 0403671), MANA WPI program from NIMS, Japan, and the Georgia Institute of Technology. The authors thank Dr. Jung-II Hong and Shu Xiang for technical assistance and discussions on XRD measurements.
    Publisher
    American Chemical Society (ACS)
    Journal
    Nano Letters
    DOI
    10.1021/nl1014298
    PubMed ID
    20681617
    ae974a485f413a2113503eed53cd6c53
    10.1021/nl1014298
    Scopus Count
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