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dc.contributor.authorZhang, Ben
dc.contributor.authorLi, Li
dc.contributor.authorJiang, Jing
dc.contributor.authorNeisser, Mark
dc.contributor.authorChun, Jun Sung
dc.contributor.authorOber, Christopher K.
dc.contributor.authorGiannelis, Emmanuel P.
dc.date.accessioned2016-02-28T06:09:54Z
dc.date.available2016-02-28T06:09:54Z
dc.date.issued2015-03-23
dc.identifier.citationZhang B, Li L, Jiang J, Neisser M, Chun JS, et al. (2015) Studying the mechanism of hybrid nanoparticle EUV photoresists. Advances in Patterning Materials and Processes XXXII. Available: http://dx.doi.org/10.1117/12.2085662.
dc.identifier.doi10.1117/12.2085662
dc.identifier.urihttp://hdl.handle.net/10754/599791
dc.description.abstractThis work focuses on the investigation of dual tone patterning mechanism with hybrid inorganic/organic photoresists. Hafnium oxide (HfO2) modified with acrylic acid was prepared and the influence of electrolyte solutions as well as pH on its particle size change was investigated. The average particle size and zeta potential of the nanoparticles in different electrolyte solutions were measured. The results show that addition of different concentrations of electrolytes changed the hydrodynamic diameter of nanoparticles in water. Increased concentration of tetramethyl ammonium hydroxide (TMAH) caused the zeta potential of nanoparticles to change from positive to negative and its hydrodynamic diameter to increase from 40 nm to 165 nm. In addition, increasing concentration of triflic acid led to the decrease of particle size and zeta potential. © (2015) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
dc.description.sponsorshipThe authors gratefully acknowledge SEMATECH for funding, as well as the Cornell Nanoscale Science and TechnologyFacility (CNF), and the KAUST-Cornell Center of Energy and Sustainability (KAUST_CU) for use of their facilities.
dc.publisherSPIE-Intl Soc Optical Eng
dc.titleStudying the mechanism of hybrid nanoparticle EUV photoresists
dc.typeConference Paper
dc.identifier.journalAdvances in Patterning Materials and Processes XXXII
dc.contributor.institutionCornell Univ. (United States)
dc.contributor.institutionSEMATECH Inc. (United States)


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