Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography
KAUST Grant NumberKUK-C1-014-12
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AbstractThis study presents the wetting properties, including hydrophilicity, hydrophobicity and anisotropic behavior, of water droplets on the silicon wafer surface with periodical nanopatterns and hierarchical structures. This study fabricates one- and two-dimensional periodical nanopatterns using laser interference lithography (LIL). The fabrication of hierarchical structures was effectively achieved by combining photolithography and LIL techniques. Unlike conventional fabrication methods, the LIL technique is mainly used to control the large-area design of periodical nanopatterns in this study. The minimum feature size for each nanopattern is 100 nm. This study shows that the wetting behavior of one-dimensional, two-dimensional, and hierarchical patterns can be obtained, benefiting the development of surface engineering for microfluidic systems. © 2010 Elsevier B.V. All rights reserved.
CitationYang Y-L, Hsu C-C, Chang T-L, Kuo L-S, Chen P-H (2010) Study on wetting properties of periodical nanopatterns by a combinative technique of photolithography and laser interference lithography. Applied Surface Science 256: 3683–3687. Available: http://dx.doi.org/10.1016/j.apsusc.2010.01.006.
SponsorsThis work was financially supported by Industrial Technology Research Institute through project number 8301XSY3K0, the KAUST Award through project number KUK-C1-014-12, and the NSC in Taiwan through grant number NSC96-2628-E-002-197MY3. We would also like to thank Chih-Chieh Su and We-Lang Lai for their expertise in the LIL process. Academic Editing is supported by National Science Council through project number 96-2217-E002-005-MY3.
JournalApplied Surface Science