Type
ArticleAuthors
Sutherland, Brandon R.Hoogland, Sjoerd
Adachi, Michael M.
Kanjanaboos, Pongsakorn
Wong, Chris T. O.
McDowell, Jeffrey J.
Xu, Jixian
Voznyy, Oleksandr

Ning, Zhijun
Houtepen, Arjan J.
Sargent, Edward H.

KAUST Grant Number
KUS-11-009-21Date
2014-10-30Online Publication Date
2014-10-30Print Publication Date
2015-01Permanent link to this record
http://hdl.handle.net/10754/599170
Metadata
Show full item recordAbstract
© 2014 Wiley-VCH Verlag GmbH & Co. KGaA. (Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1.Citation
Sutherland BR, Hoogland S, Adachi MM, Kanjanaboos P, Wong CTO, et al. (2014) Perovskite Thin Films via Atomic Layer Deposition. Advanced Materials 27: 53–58. Available: http://dx.doi.org/10.1002/adma.201403965.Sponsors
This publication is based in part on work supported by an award (KUS-11-009-21) from the King Abdullah University of Science and Technology (KAUST), by the Ontario Research Fund Research Excellence Program and by the Natural Sciences and Engineering Research Council (NSERC) of Canada. The authors thank Cambridge Nanotech, Fritz Prinz, and Orlando Trejo for their advice on ALD PbS film fabrication. The authors thank L.T. Kunneman for his assistance in the data analysis of the transient absorption measurements. The authors also thank M. Yuan, H. Dong, R. Wolowiec, and D. Kopilovic for their help during the course of the study.Publisher
WileyJournal
Advanced MaterialsPubMed ID
25359103ae974a485f413a2113503eed53cd6c53
10.1002/adma.201403965
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