AuthorsSutherland, Brandon R.
Adachi, Michael M.
Wong, Chris T. O.
McDowell, Jeffrey J.
Houtepen, Arjan J.
Sargent, Edward H.
KAUST Grant NumberKUS-11-009-21
MetadataShow full item record
Abstract© 2014 Wiley-VCH Verlag GmbH & Co. KGaA. (Graph Presented) A new method to deposit perovskite thin films that benefit from the thickness control and conformality of atomic layer deposition (ALD) is detailed. A seed layer of ALD PbS is place-exchanged with PbI2 and subsequently CH3NH3PbI3 perovskite. These films show promising optical properties, with gain coefficients of 3200 ± 830 cm-1.
CitationSutherland BR, Hoogland S, Adachi MM, Kanjanaboos P, Wong CTO, et al. (2014) Perovskite Thin Films via Atomic Layer Deposition. Advanced Materials 27: 53–58. Available: http://dx.doi.org/10.1002/adma.201403965.
SponsorsThis publication is based in part on work supported by an award (KUS-11-009-21) from the King Abdullah University of Science and Technology (KAUST), by the Ontario Research Fund Research Excellence Program and by the Natural Sciences and Engineering Research Council (NSERC) of Canada. The authors thank Cambridge Nanotech, Fritz Prinz, and Orlando Trejo for their advice on ALD PbS film fabrication. The authors thank L.T. Kunneman for his assistance in the data analysis of the transient absorption measurements. The authors also thank M. Yuan, H. Dong, R. Wolowiec, and D. Kopilovic for their help during the course of the study.
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