High-Throughput Near-Field Optical Nanoprocessing of Solution-Deposited Nanoparticles
Hwang, David J.
Ko, Seung H.
Clem, Tabitha A.
Fréchet, Jean M. J.
Grigoropoulos, Costas P.
Permanent link to this recordhttp://hdl.handle.net/10754/598495
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AbstractThe application of nanoscale electrical and biological devices will benefit from the development of nanomanufacturing technologies that are highthroughput, low-cost, and flexible. Utilizing nanomaterials as building blocks and organizing them in a rational way constitutes an attractive approach towards this goal and has been pursued for the past few years. The optical near-field nanoprocessing of nanoparticles for high-throughput nanomanufacturing is reported. The method utilizes fluidically assembled microspheres as a near-field optical confinement structure array for laserassisted nanosintering and nanoablation of nanoparticles. By taking advantage of the low processing temperature and reduced thermal diffusion in the nanoparticle film, a minimum feature size down to ≈i100nm is realized. In addition, smaller features (50nm) are obtained by furnace annealing of laser-sintered nanodots at 400 °C. The electrical conductivity of sintered nanolines is also studied. Using nanoline electrodes separated by a submicrometer gap, organic field-effect transistors are subsequently fabricated with oxygen-stable semiconducting polymer. © 2010 Wiley-VCH Verlag GmbH and Co. KGaA, Weinheim.
CitationPan H, Hwang DJ, Ko SH, Clem TA, Fréchet JMJ, et al. (2010) High-Throughput Near-Field Optical Nanoprocessing of Solution-Deposited Nanoparticles. Small 6: 1812–1821. Available: http://dx.doi.org/10.1002/smll.201000345.
SponsorsThe authors acknowledge support by the King Abdullah University of Science and Technology (KAUST). C.P.G. and D.J.H. also acknowledge support by DARPA/MTO under the SPAWAR grant N66001-08-1-2041. Any opinions, findings, and conclusions expressed in this publication are those of the authors and do not necessarily reflect the views of DARPA/MTO.
CollectionsPublications Acknowledging KAUST Support
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