Methods and devices for silicon integrated vertically aligned field effect transistors
Type
PatentPatent Status
Granted PatentAuthors
Li, JingqiKAUST Department
Advanced Nanofabrication and Thin Film Core LabDate
2015-11-19Submitted Date
2015-05-13Permanent link to this record
http://hdl.handle.net/10754/595584
Metadata
Show full item recordAbstract
Embodiments of the present disclosure provide for vertically aligned CNTFET, methods of making vertically aligned CNTFET, methods of using vertically aligned CNTFET, and the like.Patent Number
US9318718B2Application Number
US 20150333282 A1Additional Links
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