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dc.contributor.authorAlias, Mohd Sharizal
dc.contributor.authorYang, Yang
dc.contributor.authorNg, Tien Khee
dc.contributor.authorDursun, Ibrahim
dc.contributor.authorShi, Dong
dc.contributor.authorSaidaminov, Makhsud I.
dc.contributor.authorPriante, Davide
dc.contributor.authorBakr, Osman
dc.contributor.authorOoi, Boon S.
dc.date.accessioned2015-12-27T05:57:53Z
dc.date.available2015-12-27T05:57:53Z
dc.date.issued2015-12-22
dc.identifier.citationEnhanced Etching, Surface Damage Recovery, and Submicron Patterning of Hybrid Perovskites using a Chemically Gas-Assisted Focused-Ion Beam for Subwavelength Grating Photonic Applications 2015:137 The Journal of Physical Chemistry Letters
dc.identifier.issn1948-7185
dc.identifier.pmid26688008
dc.identifier.doi10.1021/acs.jpclett.5b02558
dc.identifier.urihttp://hdl.handle.net/10754/592599
dc.description.abstractThe high optical gain and absorption of organic–inorganic hybrid perovskites have attracted attention for photonic device applications. However, owing to the sensitivity of organic moieties to solvents and temperature, device processing is challenging, particularly for patterning. Here, we report the direct patterning of perovskites using chemically gas-assisted focused-ion beam (GAFIB) etching with XeF2 and I2 precursors. We demonstrate etching enhancement in addition to controllability and marginal surface damage compared to focused-ion beam (FIB) etching without precursors. Utilizing the GAFIB etching, we fabricated a uniform and periodic submicron perovskite subwavelength grating (SWG) absorber with broadband absorption and nanoscale precision. Our results demonstrate the use of FIB as a submicron patterning tool and a means of providing surface treatment (after FIB patterning to minimize optical loss) for perovskite photonic nanostructures. The SWG absorber can be patterned on perovskite solar cells to enhance the device efficiency through increasing light trapping and absorption.
dc.language.isoen
dc.publisherAmerican Chemical Society (ACS)
dc.relation.urlhttp://pubs.acs.org/doi/10.1021/acs.jpclett.5b02558
dc.rightsArchived with thanks to The Journal of Physical Chemistry Letters. This is an open access article published under an ACS AuthorChoice License, which permits copying and redistribution of the article or any adaptations for non-commercial purposes. http://pubs.acs.org/page/policy/authorchoice_termsofuse.html
dc.titleEnhanced Etching, Surface Damage Recovery, and Submicron Patterning of Hybrid Perovskites using a Chemically Gas-Assisted Focused-Ion Beam for Subwavelength Grating Photonic Applications
dc.typeArticle
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
dc.contributor.departmentElectrical Engineering Program
dc.contributor.departmentFunctional Nanomaterials Lab (FuNL)
dc.contributor.departmentImaging and Characterization Core Lab
dc.contributor.departmentKAUST Catalysis Center (KCC)
dc.contributor.departmentKAUST Solar Center (KSC)
dc.contributor.departmentMaterial Science and Engineering Program
dc.contributor.departmentPhotonics Laboratory
dc.contributor.departmentPhysical Characterization
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.identifier.journalThe Journal of Physical Chemistry Letters
dc.eprint.versionPublisher's Version/PDF
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)
kaust.personAlias, Mohd Sharizal
kaust.personYang, Yang
kaust.personNg, Tien Khee
kaust.personDursun, Ibrahim
kaust.personShi, Dong
kaust.personSaidaminov, Makhsud I.
kaust.personPriante, Davide
kaust.personBakr, Osman M.
kaust.personOoi, Boon S.
refterms.dateFOA2018-06-13T12:28:09Z
dc.date.published-online2015-12-22
dc.date.published-print2016-01-07


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