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dc.contributor.authorGhoneim, Mohamed T.
dc.contributor.authorFahad, Hossain M.
dc.contributor.authorHussain, Aftab M.
dc.contributor.authorRojas, Jhonathan Prieto
dc.contributor.authorSevilla, Galo T.
dc.contributor.authorAlfaraj, Nasir
dc.contributor.authorLizardo, Ernesto B.
dc.contributor.authorHussain, Muhammad Mustafa
dc.date.accessioned2015-12-22T14:49:47Z
dc.date.available2015-12-22T14:49:47Z
dc.date.issued2015-12-11
dc.identifier.citationEnhanced cooling in mono-crystalline ultra-thin silicon by embedded micro-air channels 2015, 5 (12):127115 AIP Advances
dc.identifier.issn2158-3226
dc.identifier.doi10.1063/1.4938101
dc.identifier.urihttp://hdl.handle.net/10754/592510
dc.description.abstractIn today’s digital world, complementary metal oxide semiconductor (CMOS) technology enabled scaling of bulk mono-crystalline silicon (100) based electronics has resulted in their higher performance but with increased dynamic and off-state power consumption. Such trade-off has caused excessive heat generation which eventually drains the charge of battery in portable devices. The traditional solution utilizing off-chip fans and heat sinks used for heat management make the whole system bulky and less mobile. Here we show, an enhanced cooling phenomenon in ultra-thin (>10 μm) mono-crystalline (100) silicon (detached from bulk substrate) by utilizing deterministic pattern of porous network of vertical “through silicon” micro-air channels that offer remarkable heat and weight management for ultra-mobile electronics, in a cost effective way with 20× reduction in substrate weight and a 12% lower maximum temperature at sustained loads. We also show the effectiveness of this event in functional MOS field effect transistors (MOSFETs) with high-κ/metal gate stacks.
dc.language.isoen
dc.publisherAIP Publishing
dc.relation.urlhttp://scitation.aip.org/content/aip/journal/adva/5/12/10.1063/1.4938101
dc.rightsArchived with thanks to AIP Advances
dc.titleEnhanced cooling in mono-crystalline ultra-thin silicon by embedded micro-air channels
dc.typeArticle
dc.contributor.departmentIntegrated Nanotechnology Lab
dc.contributor.departmentElectrical Engineering Program
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
dc.identifier.journalAIP Advances
dc.eprint.versionPublisher's Version/PDF
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)
kaust.personGhoneim, Mohamed T.
kaust.personFahad, Hossain M.
kaust.personHussain, Aftab M.
kaust.personRojas, Jhonathan Prieto
kaust.personSevilla, Galo T.
kaust.personAlfaraj, Nasir
kaust.personLizardo, Ernesto B.
kaust.personHussain, Muhammad Mustafa
refterms.dateFOA2018-06-13T12:28:30Z
dc.date.published-online2015-12-11
dc.date.published-print2015-12


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