Amorphous Zinc Oxide Integrated Wavy Channel Thin Film Transistor Based High Performance Digital Circuits
Hussain, Aftab M.
Salama, Khaled N.
Hussain, Muhammad Mustafa
KAUST DepartmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Electrical Engineering Program
Integrated Nanotechnology Lab
Integrated Disruptive Electronic Applications (IDEA) Lab
Online Publication Date2015-12-04
Print Publication Date2016-02
Permanent link to this recordhttp://hdl.handle.net/10754/583279
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AbstractHigh performance thin film transistor (TFT) can be a great driving force for display, sensor/actuator, integrated electronics, and distributed computation for Internet of Everything applications. While semiconducting oxides like zinc oxide (ZnO) present promising opportunity in that regard, still wide area of improvement exists to increase the performance further. Here, we show a wavy channel (WC) architecture for ZnO integrated TFT which increases transistor width without chip area penalty, enabling high performance in material agnostic way. We further demonstrate digital logic NAND circuit using the WC architecture and compare it to the conventional planar architecture. The WC architecture circuits have shown 2× higher peak-to-peak output voltage for the same input voltage. They also have 3× lower high-to-low propagation delay times, respectively, when compared to the planar architecture. The performance enhancement is attributed to both extra device width and enhanced field effect mobility due to higher gate field electrostatics control.
CitationAmorphous Zinc Oxide Integrated Wavy Channel Thin Film Transistor Based High Performance Digital Circuits 2015:1 IEEE Electron Device Letters
JournalIEEE Electron Device Letters