Amorphous Zinc Oxide Integrated Wavy Channel Thin Film Transistor Based High Performance Digital Circuits
Type
ArticleAuthors
Hanna, Amir
Hussain, Aftab M.

Omran, Hesham

Alshareef, Sarah
Salama, Khaled N.

Hussain, Muhammad Mustafa

KAUST Department
Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) DivisionElectrical Engineering Program
Sensors Lab
Integrated Nanotechnology Lab
Integrated Disruptive Electronic Applications (IDEA) Lab
Date
2015-12-04Online Publication Date
2015-12-04Print Publication Date
2016-02Permanent link to this record
http://hdl.handle.net/10754/583279
Metadata
Show full item recordAbstract
High performance thin film transistor (TFT) can be a great driving force for display, sensor/actuator, integrated electronics, and distributed computation for Internet of Everything applications. While semiconducting oxides like zinc oxide (ZnO) present promising opportunity in that regard, still wide area of improvement exists to increase the performance further. Here, we show a wavy channel (WC) architecture for ZnO integrated TFT which increases transistor width without chip area penalty, enabling high performance in material agnostic way. We further demonstrate digital logic NAND circuit using the WC architecture and compare it to the conventional planar architecture. The WC architecture circuits have shown 2× higher peak-to-peak output voltage for the same input voltage. They also have 3× lower high-to-low propagation delay times, respectively, when compared to the planar architecture. The performance enhancement is attributed to both extra device width and enhanced field effect mobility due to higher gate field electrostatics control.Citation
Amorphous Zinc Oxide Integrated Wavy Channel Thin Film Transistor Based High Performance Digital Circuits 2015:1 IEEE Electron Device LettersJournal
IEEE Electron Device Lettersae974a485f413a2113503eed53cd6c53
10.1109/LED.2015.2505613