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dc.contributor.authorHussain, Muhammad Mustafa
dc.contributor.authorShamiryan, Denis G.
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorSano, Kenichi
dc.contributor.authorReinhardt, Karen A.
dc.date.accessioned2015-08-24T09:54:55Z
dc.date.available2015-08-24T09:54:55Z
dc.date.issued2011-02-22
dc.identifier.citationHussain, M. M., Shamiryan, D., Paraschiv, V., Sano, K., & Reinhardt, K. A. (2011). Cleaning Challenges of High-κ/Metal Gate Structures. Handbook of Cleaning in Semiconductor Manufacturing, 237–284. doi:10.1002/9781118071748.ch7
dc.identifier.isbn9780470625958
dc.identifier.doi10.1002/9781118071748.ch7
dc.identifier.urihttp://hdl.handle.net/10754/575837
dc.description.abstractHigh-κ/metal gates are used as transistors for advanced logic applications to improve speed and eliminate electrical issues associated with polySi and SiO2 gates. Various integration schemes are possible and will be discussed, such as dual gate, gate-first, and gate-last, both of which require specialized cleaning and etching steps. Specific areas of discussion will include cleaning and conditioning of the silicon surface, forming a high-quality chemical oxide, removal of the high-κ dielectric with selectivity to the SiO2 layer, cleaning and residue removal after etching, and prevention of galvanic corrosion during cleaning. © 2011 Scrivener Publishing LLC. All rights reserved.
dc.publisherWiley
dc.subjectChemical oxide
dc.subjectDual metal gate
dc.subjectGalvanic corrosion
dc.subjectGate-first
dc.subjectGate-last
dc.subjectHigh-κ gate dielectrics
dc.subjectHigh-κ removal
dc.subjectHigh-κ/metal gate
dc.subjectInterfacial oxide
dc.subjectMetal gate electrode
dc.titleCleaning Challenges of High-κ/Metal Gate Structures
dc.typeBook Chapter
dc.contributor.departmentElectrical Engineering Program
dc.contributor.departmentIntegrated Nanotechnology Lab
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.identifier.journalHandbook of Cleaning in Semiconductor Manufacturing
dc.contributor.institutionIMEC, Leuven, Belgium
dc.contributor.institutionSilicon Light Machines, San Jose, CA, United States
dc.contributor.institutionCameo Consulting, San Jose, CA, United States
kaust.personHussain, Muhammad Mustafa


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