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dc.contributor.authorAlias, Mohd Sharizal
dc.contributor.authorLiao, Hsien-Yu
dc.contributor.authorNg, Tien Khee
dc.contributor.authorOoi, Boon S.
dc.date.accessioned2015-08-23T10:21:33Z
dc.date.available2015-08-23T10:21:33Z
dc.date.issued2015-08-19
dc.identifier.citationCharging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer 2015, 33 (6):06F701 Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
dc.identifier.issn2166-2746
dc.identifier.issn2166-2754
dc.identifier.doi10.1116/1.4929152
dc.identifier.urihttp://hdl.handle.net/10754/575504
dc.description.abstractNanoscale periodic patterning on insulating materials using focused-ion beam (FIB) is challenging because of charging effect, which causes pattern distortion and resolution degradation. In this paper, the authors used a charging suppression scheme using electron conducting polymer for the implementation of FIB patterned dielectric subwavelength grating (SWG) reflector. Prior to the FIB patterning, the authors numerically designed the optimal structure and the fabrication tolerance for all grating parameters (period, grating thickness, fill-factor, and low refractive index layer thickness) using the rigorous-coupled wave analysis computation. Then, the authors performed the FIB patterning on the dielectric SWG reflector spin-coated with electron conducting polymer for the anticharging purpose. They also performed similar patterning using thin conductive film anticharging scheme (30 nm Cr coating) for comparison. Their results show that the electron conducting polymer anticharging scheme effectively suppressing the charging effect during the FIB patterning of dielectric SWG reflector. The fabricated grating exhibited nanoscale precision, high uniformity and contrast, constant patterning, and complied with fabrication tolerance for all grating parameters across the entire patterned area. Utilization of electron conducting polymer leads to a simpler anticharging scheme with high precision and uniformity for FIB patterning on insulator materials.
dc.language.isoen
dc.publisherAmerican Vacuum Society
dc.relation.urlhttp://scitation.aip.org/content/avs/journal/jvstb/33/6/10.1116/1.4929152
dc.rightsArchived with thanks to Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena. © 2015 Author(s). All article content, except where otherwise noted, is licensed under a Creative Commons Attribution 3.0 Unported License.
dc.titleCharging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer
dc.typeArticle
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
dc.contributor.departmentElectrical Engineering Program
dc.contributor.departmentPhotonics Laboratory
dc.identifier.journalJournal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
dc.eprint.versionPublisher's Version/PDF
dc.contributor.affiliationKing Abdullah University of Science and Technology (KAUST)
kaust.personLiao, Hsien-Yu
kaust.personNg, Tien Khee
kaust.personAlias, Mohd Sharizal
kaust.personOoi, Boon S.
refterms.dateFOA2018-06-14T08:29:43Z
dc.date.published-online2015-08-19
dc.date.published-print2015-11


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