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    Charging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer

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    Online version_JVSTB_Charging suppression.pdf
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    Type
    Article
    Authors
    Alias, Mohd Sharizal cc
    Liao, Hsien-Yu cc
    Ng, Tien Khee cc
    Ooi, Boon S. cc
    KAUST Department
    Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
    Electrical Engineering Program
    Photonics Laboratory
    Date
    2015-08-19
    Online Publication Date
    2015-08-19
    Print Publication Date
    2015-11
    Permanent link to this record
    http://hdl.handle.net/10754/575504
    
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    Abstract
    Nanoscale periodic patterning on insulating materials using focused-ion beam (FIB) is challenging because of charging effect, which causes pattern distortion and resolution degradation. In this paper, the authors used a charging suppression scheme using electron conducting polymer for the implementation of FIB patterned dielectric subwavelength grating (SWG) reflector. Prior to the FIB patterning, the authors numerically designed the optimal structure and the fabrication tolerance for all grating parameters (period, grating thickness, fill-factor, and low refractive index layer thickness) using the rigorous-coupled wave analysis computation. Then, the authors performed the FIB patterning on the dielectric SWG reflector spin-coated with electron conducting polymer for the anticharging purpose. They also performed similar patterning using thin conductive film anticharging scheme (30 nm Cr coating) for comparison. Their results show that the electron conducting polymer anticharging scheme effectively suppressing the charging effect during the FIB patterning of dielectric SWG reflector. The fabricated grating exhibited nanoscale precision, high uniformity and contrast, constant patterning, and complied with fabrication tolerance for all grating parameters across the entire patterned area. Utilization of electron conducting polymer leads to a simpler anticharging scheme with high precision and uniformity for FIB patterning on insulator materials.
    Citation
    Charging suppression in focused-ion beam fabrication of visible subwavelength dielectric grating reflector using electron conducting polymer 2015, 33 (6):06F701 Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
    Publisher
    American Vacuum Society
    Journal
    Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
    DOI
    10.1116/1.4929152
    Additional Links
    http://scitation.aip.org/content/avs/journal/jvstb/33/6/10.1116/1.4929152
    ae974a485f413a2113503eed53cd6c53
    10.1116/1.4929152
    Scopus Count
    Collections
    Articles; Electrical and Computer Engineering Program; Photonics Laboratory; Computer, Electrical and Mathematical Science and Engineering (CEMSE) Division

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