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    Sub-15 nm nano-pattern generation by spacer width control for high density precisely positioned self-assembled device nanomanufacturing

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    Type
    Conference Paper
    Authors
    Rojas, Jhonathan Prieto cc
    Hussain, Muhammad Mustafa cc
    KAUST Department
    Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
    Electrical Engineering Program
    Integrated Nanotechnology Lab
    Physical Science and Engineering (PSE) Division
    Date
    2012-08
    Permanent link to this record
    http://hdl.handle.net/10754/564587
    
    Metadata
    Show full item record
    Abstract
    We present a conventional micro-fabrication based thin film vertical sidewall (spacer) width controlled nano-gap fabrication process to create arrays of nanopatterns for high density precisely positioned self-assembled nanoelectronics device integration. We have used conventional optical lithography to create base structures and then silicon nitride (Si 3N4) based spacer formation via reactive ion etching. Control of Si3N4 thickness provides accurate control of vertical sidewall (spacer) besides the base structures. Nano-gaps are fabricated between two adjacent spacers whereas the width of the gap depends on the gap between two adjacent base structures minus width of adjacent spacers. We demonstrate the process using a 32 nm node complementary metal oxide semiconductor (CMOS) platform to show its compatibility for very large scale heterogeneous integration of top-down and bottom-up fabrication as well as conventional and selfassembled nanodevices. This process opens up clear opportunity to overcome the decade long challenge of high density integration of self-assembled devices with precise position control. © 2012 IEEE.
    Citation
    Rojas, J. P., & Hussain, M. M. (2012). Sub-15 nm nano-pattern generation by spacer width control for high density precisely positioned self-assembled device nanomanufacturing. 2012 12th IEEE International Conference on Nanotechnology (IEEE-NANO). doi:10.1109/nano.2012.6322056
    Publisher
    Institute of Electrical and Electronics Engineers (IEEE)
    Journal
    2012 12th IEEE International Conference on Nanotechnology (IEEE-NANO)
    Conference/Event name
    2012 12th IEEE International Conference on Nanotechnology, NANO 2012
    ISBN
    9781467321983
    DOI
    10.1109/NANO.2012.6322056
    ae974a485f413a2113503eed53cd6c53
    10.1109/NANO.2012.6322056
    Scopus Count
    Collections
    Conference Papers; Physical Science and Engineering (PSE) Division; Electrical and Computer Engineering Program; Integrated Nanotechnology Lab; Computer, Electrical and Mathematical Science and Engineering (CEMSE) Division

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