San Roman Alerigi, Damian
Cha, Dong Kyu
Ooi, Boon S.
Ng, Tien Khee
KAUST DepartmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Electrical Engineering Program
Imaging and Characterization Core Lab
Physical Sciences and Engineering (PSE) Division
Advanced Nanofabrication, Imaging and Characterization Core Lab
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AbstractWe compare the sharpness of tungsten probe tips produced by the single-step and two-step dynamic electrochemical etching processes. A small radius of curvature (RoC) of 25 nm or less was routinely obtained when the two-step electrochemical etching (TEE) process was adopted, while the smallest achievable RoC was ∼10 nm, rendering it suitable for atomic force microscopy (AFM) or scanning tunneling microscopy (STM) applications. © 2011 IEEE.
Conference/Event name8th International Conference on High-Capacity Optical Networks and Emerging Technologies, HONET 2011