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dc.contributor.authorCai, Liang
dc.contributor.authorHu, Jing
dc.contributor.authorProrok, Barton C.
dc.contributor.authorGooneratne, Chinthaka Pasan
dc.contributor.authorKosel, Jürgen
dc.date.accessioned2015-08-04T06:23:26Z
dc.date.available2015-08-04T06:23:26Z
dc.date.issued2010-12
dc.identifier.citationLiang, C., Hu, J., Prorok, B. C., Gooneratne, C., & Kosel, J. (2010). Annealing Effect on the Performance of Sputtering Deposited Metglas Thin Films. Materials Science Forum, 667-669, 1207–1212. doi:10.4028/www.scientific.net/msf.667-669.1207
dc.identifier.isbn9783037850077
dc.identifier.issn02555476
dc.identifier.doi10.4028/www.scientific.net/MSF.667-669.1207
dc.identifier.urihttp://hdl.handle.net/10754/564318
dc.description.abstractMagnetostrictive sensors based on ferromagnetic materials have been widely used in detecting chemicals and biological species. The Metglas™ 2826MB is one of the bulk strip materials that is employed as the sensor platform. However, the sensitivity is limited by the large size of the sensors itself. In order to improve the sensitivity, we have developed a process to fabricate microscale sensors of 500 × 100 μm in size using conventional MEMS technology. As-deposited, the sensors suffered from internal stress, which was released by a annealing the sensors at 215 °C for two hours under vacuum condition. The annealing process improved the magnetic properties of the thin films and increased the resonant frequency of the sensor by 214 kHz.
dc.publisherTrans Tech Publications, Ltd.
dc.subjectAnnealing
dc.subjectMagnetic sensors
dc.subjectMicrofabrication
dc.subjectThin films
dc.titleAnnealing effect on the performance of sputtering deposited Metglas thin films
dc.typeConference Paper
dc.contributor.departmentComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
dc.contributor.departmentElectrical Engineering Program
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.contributor.departmentSensing, Magnetism and Microsystems Lab
dc.identifier.journalMaterials Science Forum
dc.conference.date21 March 2011 through 25 March 2011
dc.conference.name5th International Conference on Nanomaterials by Severe Plastic Deformation, NanoSPD5
dc.conference.locationNanjing
dc.contributor.institutionMaterials Science and Engineering, Changzhou University, China
dc.contributor.institutionMaterials Engineering, Auburn University, United States
kaust.personGooneratne, Chinthaka Pasan
kaust.personKosel, Jürgen
kaust.personCai, Liang


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