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dc.contributor.authorMorales-Acosta, M. D.*
dc.contributor.authorQuevedo-López, Manuel Angel Quevedo*
dc.contributor.authorAlshareef, Husam N.*
dc.contributor.authorGnade, Bruce E.*
dc.contributor.authorRamírez-Bon, Rafael*
dc.date.accessioned2015-08-04T06:21:42Zen
dc.date.available2015-08-04T06:21:42Zen
dc.date.issued2010-03en
dc.identifier.isbn087849281X; 9780878492817en
dc.identifier.issn02555476en
dc.identifier.doi10.4028/www.scientific.net/MSF.644.25en
dc.identifier.urihttp://hdl.handle.net/10754/564274en
dc.description.abstractOrganic-inorganic hybrid films were synthesized by a modified sol-gel process. PMMASiO2 films were prepared using methylmethacrylate (MMA), tetraethil-orthosilicate (TEOS) as silicon dioxide source, and 3-trimetoxi-silil-propil-methacrylate (TMSPM) as coupling agent. FTIR measurements were performed on the hybrid films to confirm the presence of PMMA-SiO2 bonding. In addition, metal-insulator-metal (MIM) devices were fabricated to study the dielectric constant of the films as function of frequency (1 KHz to 1 MHz). Electrical results show a weak trend of the dielectric constant of the hybrid films with MMA molar ratio. More importantly, the PMMA-SiO2 hybrid films showed a higher dielectric constant than SiO2 and PMMA layers, which is likely due to the presence of additional C-O-C bond. © (2010) Trans Tech Publications.en
dc.publisherTrans Tech Publicationsen
dc.subjectCapacitoren
dc.subjectFlexible electronicsen
dc.subjectHybrid gate dielectricen
dc.subjectHybrid pmma-SiO2en
dc.subjectOrganic-inorganic materialsen
dc.titleDielectric properties of PMMA-SiO2 hybrid filmsen
dc.typeConference Paperen
dc.contributor.departmentPhysical Sciences and Engineering (PSE) Division*
dc.contributor.departmentMaterials Science and Engineering Program*
dc.contributor.departmentFunctional Nanomaterials and Devices Research Group*
dc.identifier.journalMaterials Science Forumen
dc.conference.date29 September 2009 through 2 October 2009en
dc.conference.name1st Joint Advanced Electron Microscopy School for Nanomaterials and the Workshop on Nanomaterials, AEM-NANOMAT'09en
dc.conference.locationSaltillo, Coahuilaen
dc.contributor.institutionCINVESTAV, Libram. Norponiente 2000 Fracc. Real de Juriquilla, Querétaro 76230, Qro., Mexico*
dc.contributor.institutionDepartment of Material Science and Engineering, University of Texas at Dallas, Richardson 75083, TX, United States*
kaust.authorAlshareef, Husam N.*


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