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dc.contributor.authorMorales-Acosta, M. D.
dc.contributor.authorQuevedo-López, Manuel Angel Quevedo
dc.contributor.authorAlshareef, Husam N.
dc.contributor.authorGnade, Bruce E.
dc.contributor.authorRamírez-Bon, Rafael
dc.date.accessioned2015-08-04T06:21:42Z
dc.date.available2015-08-04T06:21:42Z
dc.date.issued2010-03
dc.identifier.citationMorales-Acosta, M. D., Quevedo-López, M. A., Alshareef, H. N., Gnade, B. E., & Ramírez-Bon, R. (2010). Dielectric Properties of PMMA-SiO2 Hybrid Films. Materials Science Forum, 644, 25–28. doi:10.4028/www.scientific.net/msf.644.25
dc.identifier.isbn087849281X; 9780878492817
dc.identifier.issn02555476
dc.identifier.doi10.4028/www.scientific.net/MSF.644.25
dc.identifier.urihttp://hdl.handle.net/10754/564274
dc.description.abstractOrganic-inorganic hybrid films were synthesized by a modified sol-gel process. PMMASiO2 films were prepared using methylmethacrylate (MMA), tetraethil-orthosilicate (TEOS) as silicon dioxide source, and 3-trimetoxi-silil-propil-methacrylate (TMSPM) as coupling agent. FTIR measurements were performed on the hybrid films to confirm the presence of PMMA-SiO2 bonding. In addition, metal-insulator-metal (MIM) devices were fabricated to study the dielectric constant of the films as function of frequency (1 KHz to 1 MHz). Electrical results show a weak trend of the dielectric constant of the hybrid films with MMA molar ratio. More importantly, the PMMA-SiO2 hybrid films showed a higher dielectric constant than SiO2 and PMMA layers, which is likely due to the presence of additional C-O-C bond. © (2010) Trans Tech Publications.
dc.publisherTrans Tech Publications, Ltd.
dc.subjectCapacitor
dc.subjectFlexible electronics
dc.subjectHybrid gate dielectric
dc.subjectHybrid pmma-SiO2
dc.subjectOrganic-inorganic materials
dc.titleDielectric properties of PMMA-SiO2 hybrid films
dc.typeConference Paper
dc.contributor.departmentFunctional Nanomaterials and Devices Research Group
dc.contributor.departmentMaterial Science and Engineering Program
dc.contributor.departmentPhysical Science and Engineering (PSE) Division
dc.identifier.journalMaterials Science Forum
dc.conference.date29 September 2009 through 2 October 2009
dc.conference.name1st Joint Advanced Electron Microscopy School for Nanomaterials and the Workshop on Nanomaterials, AEM-NANOMAT'09
dc.conference.locationSaltillo, Coahuila
dc.contributor.institutionCINVESTAV, Libram. Norponiente 2000 Fracc. Real de Juriquilla, Querétaro 76230, Qro., Mexico
dc.contributor.institutionDepartment of Material Science and Engineering, University of Texas at Dallas, Richardson 75083, TX, United States
kaust.personAlshareef, Husam N.


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