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    Observing grain boundaries in CVD-grown monolayer transition metal dichalcogenides

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    Type
    Article
    Authors
    Ly, Thuchue
    Chiu, Ming-Hui cc
    Li, Ming-yang cc
    Zhao, Jiong
    Perello, David J.
    Cichocka, Magdalena Ola
    Oh, Hyemin
    Chae, Sanghoon
    Jeong, Hyeyun
    Yao, Fei
    Li, Lain-Jong cc
    Lee, Young Hee
    KAUST Department
    Material Science and Engineering Program
    Physical Science and Engineering (PSE) Division
    Date
    2014-10-30
    Online Publication Date
    2014-10-30
    Print Publication Date
    2014-11-25
    Permanent link to this record
    http://hdl.handle.net/10754/563872
    
    Metadata
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    Abstract
    Two-dimensional monolayer transition metal dichalcogenides (TMdCs), driven by graphene science, revisit optical and electronic properties, which are markedly different from bulk characteristics. These properties are easily modified due to accessibility of all the atoms viable to ambient gases, and therefore, there is no guarantee that impurities and defects such as vacancies, grain boundaries, and wrinkles behave as those of ideal bulk. On the other hand, this could be advantageous in engineering such defects. Here, we report a method of observing grain boundary distribution of monolayer TMdCs by a selective oxidation. This was implemented by exposing directly the TMdC layer grown on sapphire without transfer to ultraviolet light irradiation under moisture-rich conditions. The generated oxygen and hydroxyl radicals selectively functionalized defective grain boundaries in TMdCs to provoke morphological changes at the boundary, where the grain boundary distribution was observed by atomic force microscopy and scanning electron microscopy. This paves the way toward the investigation of transport properties engineered by defects and grain boundaries. (Figure Presented).
    Citation
    Ly, T. H., Chiu, M.-H., Li, M.-Y., Zhao, J., Perello, D. J., Cichocka, M. O., … Lee, Y. H. (2014). Observing Grain Boundaries in CVD-Grown Monolayer Transition Metal Dichalcogenides. ACS Nano, 8(11), 11401–11408. doi:10.1021/nn504470q
    Sponsors
    This work was supported by Project Code (IBS-R011-D1).
    Publisher
    American Chemical Society (ACS)
    Journal
    ACS Nano
    DOI
    10.1021/nn504470q
    ae974a485f413a2113503eed53cd6c53
    10.1021/nn504470q
    Scopus Count
    Collections
    Articles; Physical Science and Engineering (PSE) Division; Material Science and Engineering Program

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