Wavelength-tuned light emission via modifying the band edge symmetry: Doped SnO2 as an example
KAUST DepartmentImaging and Characterization Core Lab
Physical Sciences and Engineering (PSE) Division
Chemical Science Program
Advanced Nanofabrication, Imaging and Characterization Core Lab
Advanced Membranes and Porous Materials Research Center
Materials Science and Engineering Program
KAUST Solar Center (KSC)
Nanostructured Functional Materials (NFM) laboratory
Laboratory of Nano Oxides for Sustainable Energy
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AbstractWe report the observation of ultraviolet photoluminescence and electroluminescence in indium-doped SnO2 thin films with modified "forbidden" bandgap. With increasing indium concentration in SnO 2, dominant visible light emission evolves into the ultraviolet regime in photoluminescence. Hybrid functional first-principles calculations demonstrate that the complex of indium dopant and oxygen vacancy breaks "forbidden" band gap to form allowed transition states. Furthermore, undoped and 10% indium-doped SnO2 layers are synthesized on p-type GaN substrates to obtain SnO2-based heterojunction light-emitting diodes. A dominant visible emission band is observed in the undoped SnO 2-based heterojunction, whereas strong near-ultraviolet emission peak at 398 nm is observed in the indium-doped SnO2-based heterojunction. Our results demonstrate an unprecedented doping-based approach toward tailoring the symmetry of band edge states and recovering ultraviolet light emission in wide-bandgap oxides. © 2014 American Chemical Society.
SponsorsThis work was supported by the National Natural Science Foundation of China under Grant Nos. 61205038 and 11274135, Natural Science Foundation of Jilin province under Grant No. 201115013, and Ph.D. Programs Foundation of Ministry of Education of China under Grant No. 20120061120011. The work is supported by the Scientific and Technological Research Project of the "12th Five-Year Plan" of Jilin Provincial Education Department under Grant No. 2013189. This work was supported by High Performance Computing Center of Jilin University, China.
PublisherAmerican Chemical Society (ACS)