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dc.contributor.authorZhao, Chao
dc.contributor.authorHedhili, Mohamed N.
dc.contributor.authorLi, Jingqi
dc.contributor.authorWang, Qingxiao
dc.contributor.authorYang, Yang
dc.contributor.authorChen, Long
dc.contributor.authorLI, LIANG
dc.date.accessioned2015-08-03T11:16:10Z
dc.date.available2015-08-03T11:16:10Z
dc.date.issued2013-09
dc.identifier.citationZhao, C., Hedhili, M. N., Li, J., Wang, Q., Yang, Y., Chen, L., & Li, L. (2013). Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition. Thin Solid Films, 542, 38–44. doi:10.1016/j.tsf.2013.06.010
dc.identifier.issn00406090
dc.identifier.doi10.1016/j.tsf.2013.06.010
dc.identifier.urihttp://hdl.handle.net/10754/562935
dc.description.abstractThe growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies. © 2013 Elsevier B.V. All rights reserved.
dc.publisherElsevier BV
dc.subjectAtomic force microscopy
dc.subjectAtomic layer deposition
dc.subjectEllipsometer
dc.subjectRaman spectroscopy
dc.subjectTiO2 film
dc.subjectX-ray diffraction
dc.titleGrowth and characterization of titanium oxide by plasma enhanced atomic layer deposition
dc.typeArticle
dc.contributor.departmentImaging and Characterization Core Lab
dc.contributor.departmentAdvanced Nanofabrication, Imaging and Characterization Core Lab
dc.contributor.departmentCore Labs
dc.identifier.journalThin Solid Films
kaust.personZhao, Chao
kaust.personHedhili, Mohamed N.
kaust.personLi, Jingqi
kaust.personWang, Qingxiao
kaust.personYang, Yang
kaust.personChen, Long
kaust.personLI, LIANG


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