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    Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition

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    Type
    Article
    Authors
    Zhao, Chao cc
    Hedhili, Mohamed N. cc
    Li, Jingqi
    Wang, Qingxiao
    Yang, Yang
    Chen, Long
    LI, LIANG
    KAUST Department
    Imaging and Characterization Core Lab
    Advanced Nanofabrication, Imaging and Characterization Core Lab
    Core Labs
    Date
    2013-09
    Permanent link to this record
    http://hdl.handle.net/10754/562935
    
    Metadata
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    Abstract
    The growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies. © 2013 Elsevier B.V. All rights reserved.
    Citation
    Zhao, C., Hedhili, M. N., Li, J., Wang, Q., Yang, Y., Chen, L., & Li, L. (2013). Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition. Thin Solid Films, 542, 38–44. doi:10.1016/j.tsf.2013.06.010
    Publisher
    Elsevier BV
    Journal
    Thin Solid Films
    DOI
    10.1016/j.tsf.2013.06.010
    ae974a485f413a2113503eed53cd6c53
    10.1016/j.tsf.2013.06.010
    Scopus Count
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    Articles; Imaging and Characterization Core Lab

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