Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition
KAUST DepartmentImaging and Characterization Core Lab
Advanced Nanofabrication, Imaging and Characterization Core Lab
Permanent link to this recordhttp://hdl.handle.net/10754/562935
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AbstractThe growth of TiO2 films by plasma enhanced atomic layer deposition using Star-Ti as a precursor has been systematically studied. The conversion from amorphous to crystalline TiO2 was observed either during high temperature growth or annealing process of the films. The refractive index and bandgap of TiO2 films changed with the growth and annealing temperatures. The optimization of the annealing conditions for TiO2 films was also done by morphology and density studies. © 2013 Elsevier B.V. All rights reserved.
CitationZhao, C., Hedhili, M. N., Li, J., Wang, Q., Yang, Y., Chen, L., & Li, L. (2013). Growth and characterization of titanium oxide by plasma enhanced atomic layer deposition. Thin Solid Films, 542, 38–44. doi:10.1016/j.tsf.2013.06.010
JournalThin Solid Films