Long-term RF burn-in effects on dielectric charging of MEMS capacitive switches
dc.contributor.author | Molinero, David G. | |
dc.contributor.author | Luo, Xi | |
dc.contributor.author | Shen, Chao | |
dc.contributor.author | Palego, Cristiano | |
dc.contributor.author | Hwang, James | |
dc.contributor.author | Goldsmith, Charles L. | |
dc.date.accessioned | 2015-08-03T11:01:02Z | |
dc.date.available | 2015-08-03T11:01:02Z | |
dc.date.issued | 2013-03 | |
dc.identifier.issn | 15304388 | |
dc.identifier.doi | 10.1109/TDMR.2013.2246567 | |
dc.identifier.uri | http://hdl.handle.net/10754/562677 | |
dc.description.abstract | This paper experimentally quantified the long-term effects of RF burn-in, in terms of burn-in and recovery times, and found the effects to be semipermanent. Specifically, most of the benefit could be realized after approximately 20 min of RF burn-in, which would then last for several months. Additionally, since similar effects were observed on both real and faux switches, the effects appeared to be of electrical rather than mechanical nature. These encouraging results should facilitate the application of the switches in RF systems, where high RF power could be periodically applied to rejuvenate the switches. © 2001-2011 IEEE. | |
dc.publisher | Institute of Electrical and Electronics Engineers (IEEE) | |
dc.subject | Dielectric films | |
dc.subject | dielectric materials | |
dc.subject | microelectromechanical devices | |
dc.subject | microwave devices | |
dc.subject | switches | |
dc.title | Long-term RF burn-in effects on dielectric charging of MEMS capacitive switches | |
dc.type | Article | |
dc.contributor.department | Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division | |
dc.contributor.department | Electrical Engineering Program | |
dc.contributor.department | Material Science and Engineering Program | |
dc.contributor.department | Materials Science and Engineering Program | |
dc.identifier.journal | IEEE Transactions on Device and Materials Reliability | |
dc.contributor.institution | Lehigh University, Bethlehem, PA 18015, United States | |
dc.contributor.institution | MEMtronics Corporation, Richardson, TX 75081, United States | |
kaust.person | Shen, Chao |
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Material Science and Engineering Program
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Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
For more information visit: https://cemse.kaust.edu.sa/