Electron-beam lithography of gold nanostructures for surface-enhanced Raman scattering
Type
ArticleKAUST Department
Imaging and Characterization Core LabComputer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division
Computer Science Program
Advanced Nanofabrication, Imaging and Characterization Core Lab
Core Labs
Date
2012-10-26Online Publication Date
2012-10-26Print Publication Date
2012-12-01Permanent link to this record
http://hdl.handle.net/10754/562376
Metadata
Show full item recordAbstract
The fabrication of nanostructured substrates with precisely controlled geometries and arrangements plays an important role in studies of surface-enhanced Raman scattering (SERS). Here, we present two processes based on electron-beam lithography to fabricate gold nanostructures for SERS. One process involves making use of metal lift-off and the other involves the use of the plasma etching. These two processes allow the successful fabrication of gold nanostructures with various kinds of geometrical shapes and different periodic arrangements. 4-mercaptopyridine (4-MPy) and Rhodamine 6G (R6G) molecules are used to probe SERS signals on the nanostructures. The SERS investigations on the nanostructured substrates demonstrate that the gold nanostructured substrates have resulted in large SERS enhancement, which is highly dependent on the geometrical shapes and arrangements of the gold nanostructures. © 2012 IOP Publishing Ltd.Citation
Yue, W., Wang, Z., Yang, Y., Chen, L., Syed, A., Wong, K., & Wang, X. (2012). Electron-beam lithography of gold nanostructures for surface-enhanced Raman scattering. Journal of Micromechanics and Microengineering, 22(12), 125007. doi:10.1088/0960-1317/22/12/125007Publisher
IOP Publishingae974a485f413a2113503eed53cd6c53
10.1088/0960-1317/22/12/125007